Inventor · disambiguated record
Nobuhito Shima
Also filed as: SHIMA NOBUHITO
11 granted patents·9 pending applications·59 citations·filing 2001–2023
88Inventor score
Files withHITACHI INT ELECTRIC INC11KOKUSAI ELECTRIC CORP4KONTANI TADASHI2HITACHI KOKUSAI ELECTRIC1SAKAI MASANORI1
Top patents by PatentIndex Score
20 records- 0196US7900580B2Substrate processing apparatus and reaction containerHITACHI INT ELECTRIC INC·Filed 2007·Granted Mar 8, 2011·27 cites·13 claims
- 0293US8261692B2Substrate processing apparatus and reaction containerKONTANI TADASHI·Filed 2010·Granted Sep 11, 2012·10 cites·7 claims
- 0390US8047158B2Substrate processing apparatus and reaction containerHITACHI INT ELECTRIC INC·Filed 2007·Granted Nov 1, 2011·8 cites·11 claims
- 0484US11633753B2Nozzle installation jigKOKUSAI ELECTRIC CORP·Filed 2021·Granted Apr 25, 2023·1 cites·16 claims
- 0583US9169553B2Semiconductor device producing methodSAKAI MASANORI·Filed 2011·Granted Oct 27, 2015·2 cites·3 claims
- 0676US11986847B2Nozzle installation jigKOKUSAI ELECTRIC CORP·Filed 2023·Granted May 21, 2024·0 cites·19 claims
- 0770US8875656B2Substrate processing apparatusKONTANI TADASHI·Filed 2009·Granted Nov 4, 2014·1 cites·9 claims
- 0867US2009176017A1Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2009·Application pending·0 cites
- 0964US6576063B2Apparatus and method for use in manufacturing a semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2001·Granted Jun 10, 2003·8 cites·16 claims
- 1057US7713582B2Substrate processing method for film formationHITACHI KOKUSAI ELECTRIC·Filed 2008·Granted May 11, 2010·0 cites·11 claims
- 1154US2023144886A1Method of manufacturing semiconductor device, method of managing parts, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2022·Application pending·0 cites
- 1250US7033937B2Apparatus and method for use in manufacturing a semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2003·Granted Apr 25, 2006·2 cites·18 claims
- 1349US2006124058A1Substrate processing deviceHITACHI INT ELECTRIC INC·Filed 2003·Application pending·0 cites
- 1448US2004025786A1Substrate processing apparatus and reaction containerFiled 2003·Application pending·0 cites
- 1547US2006150905A1Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2003·Application pending·0 cites
- 1646US11535931B2Method of manufacturing semiconductor device, method of managing parts, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2019·Granted Dec 27, 2022·0 cites·13 claims
- 1746US2010323507A1Substrate processing apparatus and producing method of deviceHITACHI INT ELECTRIC INC·Filed 2010·Application pending·0 cites
- 1846US2010258530A1Substrate processing apparatus and producing method of deviceHITACHI INT ELECTRIC INC·Filed 2010·Application pending·0 cites
- 1941US2006260544A1Substrate processing and method of manufacturing deviceHITACHI INT ELECTRIC INC·Filed 2004·Application pending·0 cites
- 2036US2003221623A1Fabricating a semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →