Inventor · disambiguated record
Peter L. G. Ventzek
Also filed as: VENTZEK PETER · VENTZEK PETER L · VENTZEK PETER L G
35 granted patents·9 pending applications·233 citations·filing 2004–2021
97Inventor score
Files withTOKYO ELECTRON LTD20FREESCALE SEMICONDUCTOR INC9HOLLAND JOHN PATRICK7ZHAO JIANPING3LAM RES CORP2
Top patents by PatentIndex Score
44 records- 0197US11079682B1Methods for extreme ultraviolet (EUV) resist patterning developmentTOKYO ELECTRON LTD·Filed 2020·Granted Aug 3, 2021·18 cites·20 claims
- 0297US9768033B2Methods for high precision etching of substratesTOKYO ELECTRON LTD·Filed 2015·Granted Sep 19, 2017·29 cites·19 claims
- 0396US8900402B2Semiconductor processing system having multiple decoupled plasma sourcesHOLLAND JOHN PATRICK·Filed 2011·Granted Dec 2, 2014·38 cites·20 claims
- 0495US7592248B2Method of forming semiconductor device having nanotube structuresFREESCALE SEMICONDUCTOR INC·Filed 2005·Granted Sep 22, 2009·34 cites·11 claims
- 0594US9177756B2E-beam enhanced decoupled source for semiconductor processingHOLLAND JOHN PATRICK·Filed 2012·Granted Nov 3, 2015·23 cites·19 claims
- 0688US8900403B2Semiconductor processing system having multiple decoupled plasma sourcesHOLLAND JOHN PATRICK·Filed 2011·Granted Dec 2, 2014·7 cites·19 claims
- 0787US9111728B2E-beam enhanced decoupled source for semiconductor processingHOLLAND JOHN PATRICK·Filed 2012·Granted Aug 18, 2015·8 cites·20 claims
- 0887US7335602B2Charge-free layer by layer etching of dielectricsFREESCALE SEMICONDUCTOR INC·Filed 2006·Granted Feb 26, 2008·12 cites·17 claims
- 0986US11605539B2Defect correction on metal resistsTOKYO ELECTRON LTD·Filed 2021·Granted Mar 14, 2023·1 cites·20 claims
- 1086US7579282B2Method for removing metal foot during high-k dielectric/metal gate etchingFREESCALE SEMICONDUCTOR INC·Filed 2006·Granted Aug 25, 2009·11 cites·20 claims
- 1185US9396900B2Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma propertiesTOKYO ELECTRON LTD·Filed 2012·Granted Jul 19, 2016·10 cites·18 claims
- 1284US10211065B2Methods for high precision plasma etching of substratesTOKYO ELECTRON LTD·Filed 2015·Granted Feb 19, 2019·3 cites·11 claims
- 1383US11527413B2Cyclic plasma etch processTOKYO ELECTRON LTD·Filed 2021·Granted Dec 13, 2022·1 cites·20 claims
- 1482US10483127B2Methods for high precision plasma etching of substratesTOKYO ELECTRON LTD·Filed 2018·Granted Nov 19, 2019·2 cites·10 claims
- 1581US7449414B2Method of treating a mask layer prior to performing an etching processTOKYO ELECTRON LTD·Filed 2006·Granted Nov 11, 2008·7 cites·21 claims
- 1676US7763551B2RLSA CVD deposition control using halogen gas for hydrogen scavengingTOKYO ELECTRON LTD·Filed 2008·Granted Jul 27, 2010·2 cites·14 claims
- 1775US7772584B2Laterally grown nanotubes and method of formationFREESCALE SEMICONDUCTOR INC·Filed 2008·Granted Aug 10, 2010·5 cites·16 claims
- 1875US7371677B2Laterally grown nanotubes and method of formationFREESCALE SEMICONDUCTOR INC·Filed 2005·Granted May 13, 2008·5 cites·10 claims
- 1974US7642193B2Method of treating a mask layer prior to performing an etching processTOKYO ELECTRON LTD·Filed 2006·Granted Jan 5, 2010·4 cites·23 claims
- 2074US7572386B2Method of treating a mask layer prior to performing an etching processTOKYO ELECTRON LTD·Filed 2006·Granted Aug 11, 2009·4 cites·19 claims
- 2170US12189297B2Methods for extreme ultraviolet (EUV) resist patterning developmentTOKYO ELECTRON LTD·Filed 2021·Granted Jan 7, 2025·0 cites·20 claims
- 2262US2021249226A1Plasma Processing System with Synchronized Signal ModulationTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 2361US9111727B2Plasma tuning rods in microwave resonator plasma sourcesZHAO JIANPING·Filed 2011·Granted Aug 18, 2015·1 cites·7 claims
- 2460US9947557B2Semiconductor processing system having multiple decoupled plasma sourcesLAM RES CORP·Filed 2014·Granted Apr 17, 2018·0 cites·20 claims
- 2558US9793095B2Microwave surface-wave plasma deviceTOKYO ELECTRON LTD·Filed 2014·Granted Oct 17, 2017·0 cites·11 claims
- 2657US9947515B2Microwave surface-wave plasma deviceTOKYO ELECTRON LTD·Filed 2014·Granted Apr 17, 2018·0 cites·20 claims
- 2757US8808496B2Plasma tuning rods in microwave processing systemsZHAO JIANPING·Filed 2011·Granted Aug 19, 2014·1 cites·14 claims
- 2856US2018240686A1Semiconductor Processing System Having Multiple Decoupled Plasma SourcesLAM RES CORP·Filed 2018·Application pending·0 cites
- 2954US6969568B2Method for etching a quartz layer in a photoresistless semiconductor maskFREESCALE SEMICONDUCTOR INC·Filed 2004·Granted Nov 29, 2005·4 cites·20 claims
- 3053US8980046B2Semiconductor processing system with source for decoupled ion and radical controlKOSHIISHI AKIRA·Filed 2012·Granted Mar 17, 2015·0 cites·21 claims
- 3153US7279433B2Deposition and patterning of boron nitride nanotube ILDFREESCALE SEMICONDUCTOR INC·Filed 2004·Granted Oct 9, 2007·3 cites·47 claims
- 3252US7751177B2Thin-film capacitor with a field modification layerFREESCALE SEMICONDUCTOR INC·Filed 2009·Granted Jul 6, 2010·0 cites·20 claims
- 3351US11183398B2Ruthenium hard mask processTOKYO ELECTRON LTD·Filed 2019·Granted Nov 23, 2021·0 cites·21 claims
- 3448US9530621B2Integrated induction coil and microwave antenna as an all-planar sourceTOKYO ELECTRON LTD·Filed 2014·Granted Dec 27, 2016·0 cites·10 claims
- 3546US7534693B2Thin-film capacitor with a field modification layer and methods for forming the sameFREESCALE SEMICONDUCTOR INC·Filed 2006·Granted May 19, 2009·0 cites·20 claims
- 3642US2007049048A1Method and apparatus for improving nitrogen profile during plasma nitridationRAUF SHAHID·Filed 2005·Application pending·0 cites
- 3742US2014262040A1Method and system using plasma tuning rods for plasma processingTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3841US2012258607A1E-Beam Enhanced Decoupled Source for Semiconductor ProcessingHOLLAND JOHN PATRICK·Filed 2012·Application pending·0 cites
- 3941US2012255678A1Multi-Frequency Hollow Cathode System for Substrate Plasma ProcessingHOLLAND JOHN PATRICK·Filed 2011·Application pending·0 cites
- 4041US2013084706A1Plasma-Tuning Rods in Surface Wave Antenna (SWA) SourcesZHAO JIANPING·Filed 2011·Application pending·0 cites
- 4140US2012258555A1Multi-Frequency Hollow Cathode and Systems Implementing the SameHOLLAND JOHN PATRICK·Filed 2011·Application pending·0 cites
- 4239US9728416B2Plasma tuning rods in microwave resonator plasma sourcesTOKYO ELECTRON LTD·Filed 2013·Granted Aug 8, 2017·0 cites·20 claims
- 4339US9396955B2Plasma tuning rods in microwave resonator processing systemsTOKYO ELECTRON LTD·Filed 2013·Granted Jul 19, 2016·0 cites·12 claims
- 4435US2005196961A1Method for forming a semiconductor device having metal silicideFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →