Inventor · disambiguated record
Satoru Shimura
Also filed as: SHIMURA SATORU
20 granted patents·15 pending applications·535 citations·filing 2000–2025
93Inventor score
Top patents by PatentIndex Score
35 records- 0198US9741559B2Film forming method, computer storage medium, and film forming systemTOKYO ELECTRON LTD·Filed 2014·Granted Aug 22, 2017·466 cites·16 claims
- 0286US10964606B2Film forming system, film forming method, and computer storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Mar 30, 2021·4 cites·3 claims
- 0386US9329483B2Film forming method, non-transitory computer storage medium and film forming apparatusTOKYO ELECTRON LTD·Filed 2013·Granted May 3, 2016·7 cites·9 claims
- 0483US7401988B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2007·Granted Jul 22, 2008·7 cites·15 claims
- 0581US8075730B2Apparatus for manufacturing a semiconductor deviceSHIMURA SATORU·Filed 2005·Granted Dec 13, 2011·10 cites·18 claims
- 0679US8791030B2Coating treatment method and coating treatment apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jul 29, 2014·4 cites·21 claims
- 0778US8037890B2Substrate cleaning device and substrate cleaning methodTOKYO ELECTRON LTD·Filed 2006·Granted Oct 18, 2011·5 cites·6 claims
- 0877US10998183B2Substrate cleaning apparatus, substrate cleaning system, substrate cleaning method and memory mediumTOKYO ELECTRON LTD·Filed 2016·Granted May 4, 2021·2 cites·20 claims
- 0975US8283253B2Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatusYAEGASHI HIDETAMI·Filed 2009·Granted Oct 9, 2012·4 cites·12 claims
- 1074US9341952B2Substrate treatment method, non-transitory computer storage medium and substrate treatment systemTOKYO ELECTRON LTD·Filed 2014·Granted May 17, 2016·2 cites·18 claims
- 1173US6485203B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Nov 26, 2002·17 cites·16 claims
- 1271US8273661B2Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatusYAEGASHI HIDETAMI·Filed 2009·Granted Sep 25, 2012·3 cites·12 claims
- 1369US10025190B2Substrate treatment systemTOKYO ELECTRON LTD·Filed 2014·Granted Jul 17, 2018·2 cites·12 claims
- 1469US9280052B2Substrate treatment method, non-transitory computer storage medium and substrate treatment systemTOKYO ELECTRON LTD·Filed 2014·Granted Mar 8, 2016·2 cites·4 claims
- 1563US2025092514A1Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1656US2024036473A1Substrate treatment method, and computer storage mediumTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1756US2024347354A1Heat-treating method, heat-treating apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1855US2025231116A1Method for observing surfaceTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1953US2024120217A1Substrate treatment method, substrate treatment apparatus, and computer storage mediumTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2051US2014041685A1Substrate cleaning apparatus, substrate cleaning system, substrate cleaning method and memory mediumTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 2149US7781342B2Substrate treatment method for etching a base film using a resist patternTOKYO ELECTRON LTD·Filed 2005·Granted Aug 24, 2010·0 cites·13 claims
- 2249US2012305183A1Semiconductor device manufacturing apparatusYAEGASHI HIDETAMI·Filed 2012·Application pending·0 cites
- 2348US2009208852A1Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatusTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2448US2012312472A1Semiconductor device manufacturing apparatusYAEGASHI HIDETAMI·Filed 2012·Application pending·0 cites
- 2547US2012006362A1Substrate cleaning device and substrate cleaning methodYAMAMOTO TARO·Filed 2011·Application pending·0 cites
- 2646US2010307683A1Substrate treatment method and substrate treatment apparatusTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 2745US12197129B2Substrate treatment method and substrate treatment systemTOKYO ELECTRON LTD·Filed 2019·Granted Jan 14, 2025·0 cites·13 claims
- 2845US2008070167A1Exposure and developing methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 2944US8202682B2Method of manufacturing semiconductor device, and resist coating and developing systemIWAO FUMIKO·Filed 2009·Granted Jun 19, 2012·0 cites·16 claims
- 3044US2012034779A1Apparatus for manufacturing a semiconductor deviceSHIMURA SATORU·Filed 2011·Application pending·0 cites
- 3142US7485568B2Method for forming wiring of semiconductor deviceTOKYO ELECTRON LTD·Filed 2005·Granted Feb 3, 2009·0 cites·3 claims
- 3241US10101669B2Exposure apparatus, resist pattern forming method, and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Oct 16, 2018·0 cites·22 claims
- 3340US2007184379A1Peeling-off method and reworking method of resist filmTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 3440US2006068337A1Substrate processing methodTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 3539US12047861B2Communication system, communication method, and serverNEC CORP·Filed 2020·Granted Jul 23, 2024·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →