Inventor · disambiguated record
Sirish Reddy
Also filed as: REDDY SIRISH · REDDY SIRISH K
24 granted patents·8 pending applications·687 citations·filing 2003–2024
96Inventor score
Files withLAM RES CORP21NOVELLUS SYSTEMS INC4VARADARAJAN BHADRI2BOWMAN CHRISTOPHER N1HOLLISTER ALICE1
Top patents by PatentIndex Score
32 records- 0198US11209729B2Vacuum-integrated hardmask processes and apparatusLAM RES CORP·Filed 2019·Granted Dec 28, 2021·21 cites·14 claims
- 0298US10831096B2Vacuum-integrated hardmask processes and apparatusLAM RES CORP·Filed 2018·Granted Nov 10, 2020·34 cites·18 claims
- 0398US10514598B2Vacuum-integrated hardmask processes and apparatusLAM RES CORP·Filed 2017·Granted Dec 24, 2019·33 cites·10 claims
- 0498US9778561B2Vacuum-integrated hardmask processes and apparatusLAM RES CORP·Filed 2015·Granted Oct 3, 2017·380 cites·9 claims
- 0596US7906817B1High compressive stress carbon liners for MOS devicesNOVELLUS SYSTEMS INC·Filed 2008·Granted Mar 15, 2011·40 cites·8 claims
- 0695US9023731B2Carbon deposition-etch-ash gap fill processNOVELLUS SYSTEMS INC·Filed 2013·Granted May 5, 2015·36 cites·20 claims
- 0794US9362133B2Method for forming a mask by etching conformal film on patterned ashable hardmaskLAM RES CORP·Filed 2013·Granted Jun 7, 2016·19 cites·17 claims
- 0894US8512818B1Cascaded cure approach to fabricate highly tensile silicon nitride filmsVARADARAJAN BHADRI·Filed 2012·Granted Aug 20, 2013·21 cites·18 claims
- 0994US8211510B1Cascaded cure approach to fabricate highly tensile silicon nitride filmsVARADARAJAN BHADRI·Filed 2007·Granted Jul 3, 2012·33 cites·25 claims
- 1091US9337068B2Oxygen-containing ceramic hard masks and associated wet-cleansLAM RES CORP·Filed 2013·Granted May 10, 2016·13 cites·16 claims
- 1191US2025053080A1Vacuum-integrated hardmask processes and apparatusLAM RES CORP·Filed 2024·Application pending·0 cites
- 1289US9589799B2High selectivity and low stress carbon hardmask by pulsed low frequency RF powerLAM RES CORP·Filed 2014·Granted Mar 7, 2017·10 cites·17 claims
- 1388US9520295B2Metal doping of amorphous carbon and silicon films used as hardmasks in substrate processing systemsLAM RES CORP·Filed 2015·Granted Dec 13, 2016·6 cites·36 claims
- 1487US9320387B2Sulfur doped carbon hard masksLAM RES CORP·Filed 2014·Granted Apr 26, 2016·6 cites·17 claims
- 1585US10192759B2Image reversal with AHM gap fill for multiple patterningLAM RES CORP·Filed 2016·Granted Jan 29, 2019·4 cites·16 claims
- 1685US9018103B2High aspect ratio etch with combination maskLAM RES CORP·Filed 2013·Granted Apr 28, 2015·5 cites·16 claims
- 1784US8362571B1High compressive stress carbon liners for MOS devicesNOVELLUS SYSTEMS INC·Filed 2011·Granted Jan 29, 2013·5 cites·17 claims
- 1884US2023273516A1Vacuum-integrated hardmask processes and apparatusLAM RES CORP·Filed 2023·Application pending·0 cites
- 1984US2023266662A1Vacuum-integrated hardmask processes and apparatusLAM RES CORP·Filed 2023·Application pending·0 cites
- 2083US9117668B2PECVD deposition of smooth silicon filmsHOLLISTER ALICE·Filed 2012·Granted Aug 25, 2015·8 cites·22 claims
- 2181US9928994B2Methods for decreasing carbon-hydrogen content of amorphous carbon hardmask filmsLAM RES CORP·Filed 2015·Granted Mar 27, 2018·3 cites·4 claims
- 2279US8628618B2Precursor vapor generation and delivery system with filters and filter monitoring systemSLEVIN DAMIEN·Filed 2010·Granted Jan 14, 2014·4 cites·10 claims
- 2379US2022075260A1Vacuum-integrated hardmask processes and apparatusLAM RES CORP·Filed 2021·Application pending·0 cites
- 2476US10242848B2Carrier ring structure and chamber systems including the sameLAM RES CORP·Filed 2014·Granted Mar 26, 2019·5 cites·24 claims
- 2567US9659783B2High aspect ratio etch with combination maskLAM RES CORP·Filed 2015·Granted May 23, 2017·1 cites·16 claims
- 2648US9637821B2Method for supplying vaporized precursorLAM RES CORP·Filed 2013·Granted May 2, 2017·0 cites·11 claims
- 2746US10242883B2High aspect ratio etch of oxide metal oxide metal stackLAM RES CORP·Filed 2017·Granted Mar 26, 2019·0 cites·18 claims
- 2845US2015325435A1Pecvd deposition of smooth silicon filmsNOVELLUS SYSTEMS INC·Filed 2015·Application pending·0 cites
- 2943US9875890B2Deposition of metal dielectric film for hardmasksLAM RES CORP·Filed 2015·Granted Jan 23, 2018·0 cites·27 claims
- 3042US2008274335A1Photolytic Polymer Surface ModificationUNIV COLORADO·Filed 2005·Application pending·0 cites
- 3141US2006069176A1Polymer derived ceramic materialsBOWMAN CHRISTOPHER N·Filed 2003·Application pending·0 cites
- 3238US2012258261A1Increasing etch selectivity of carbon films with lower absorption co-efficient and stressREDDY SIRISH·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →