Inventor · disambiguated record
Tuochuan Huang
Also filed as: HUANG TUOCHUAN
19 granted patents·4 pending applications·287 citations·filing 2004–2022
92Inventor score
Top patents by PatentIndex Score
23 records- 0196US8292698B1On-line chamber cleaning using dry ice blastingSHIH HONG·Filed 2007·Granted Oct 23, 2012·67 cites·20 claims
- 0296US7052553B1Wet cleaning of electrostatic chucksLAM RES CORP·Filed 2004·Granted May 30, 2006·174 cites·21 claims
- 0379US9105676B2Method of removing damaged epoxy from electrostatic chuckLAM RES CORP·Filed 2012·Granted Aug 11, 2015·5 cites·12 claims
- 0479US7976641B1Extending storage time of removed plasma chamber components prior to cleaning thereofLAM RES CORP·Filed 2005·Granted Jul 12, 2011·3 cites·20 claims
- 0578US7507670B2Silicon electrode assembly surface decontamination by acidic solutionLAM RES CORP·Filed 2004·Granted Mar 24, 2009·20 cites·21 claims
- 0674US10857625B2Texturizing a surface without bead blastingAPPLIED MATERIALS INC·Filed 2019·Granted Dec 8, 2020·0 cites·20 claims
- 0772US12318868B2Texturizing a surface without bead blastingAPPLIED MATERIALS INC·Filed 2020·Granted Jun 3, 2025·0 cites·18 claims
- 0871US7442114B2Methods for silicon electrode assembly etch rate and etch uniformity recoveryLAM RES CORP·Filed 2004·Granted Oct 28, 2008·14 cites·19 claims
- 0969US10434604B2Texturizing a surface without bead blastingAPPLIED MATERIALS INC·Filed 2018·Granted Oct 8, 2019·0 cites·13 claims
- 1066US8854451B2Automated bubble detection apparatus and methodCORMIER JOSH·Filed 2011·Granted Oct 7, 2014·2 cites·14 claims
- 1164US8545639B2Method of cleaning aluminum plasma chamber partsSHIH HONG·Filed 2011·Granted Oct 1, 2013·1 cites·19 claims
- 1263US8143904B2System and method for testing an electrostatic chuckSHIH HONG·Filed 2008·Granted Mar 27, 2012·1 cites·10 claims
- 1362US8216388B2Extending storage time of removed plasma chamber components prior to cleaning thereofSHIH HONG·Filed 2011·Granted Jul 10, 2012·0 cites·20 claims
- 1461US12427550B2Methods for removing deposits on the surface of a chamber componentAPPLIED MATERIALS INC·Filed 2022·Granted Sep 30, 2025·0 cites·11 claims
- 1552US2019291214A1Laser polishing ceramic surfaces of processing components to be used in the manufacturing of semiconductor devicesAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1651US9387521B2Method of wet cleaning aluminum chamber partsLAM RES CORP·Filed 2013·Granted Jul 12, 2016·0 cites·20 claims
- 1751US9082805B2System and method for testing an electrostatic chuckSHIH HONG·Filed 2012·Granted Jul 14, 2015·0 cites·6 claims
- 1846US9054148B2Method for performing hot water seal on electrostatic chuckSHIH HONG·Filed 2011·Granted Jun 9, 2015·0 cites·12 claims
- 1946US2011146909A1Methods for wet cleaning quartz surfaces of components for plasma processing chambersLAM RES CORP·Filed 2011·Application pending·0 cites
- 2045US11776822B2Wet cleaning of electrostatic chuckAPPLIED MATERIALS INC·Filed 2019·Granted Oct 3, 2023·0 cites·14 claims
- 2142US2005274396A1Methods for wet cleaning quartz surfaces of components for plasma processing chambersSHIH HONG·Filed 2004·Application pending·0 cites
- 2241US12327738B2Integrated semiconductor part cleaning systemAPPLIED MATERIALS INC·Filed 2019·Granted Jun 10, 2025·0 cites·20 claims
- 2341US2015235889A1System and method for performing hot water seal on electrostatic chuckLAM RES CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →