Inventor · disambiguated record
William Robert Entley
Also filed as: ENTLEY WILLIAM · ENTLEY WILLIAM R · ENTLEY WILLIAM ROBERT
18 granted patents·14 pending applications·623 citations·filing 2001–2024
93Inventor score
Top patents by PatentIndex Score
32 records- 0198US9449793B2Systems, methods and apparatus for choked flow element extractionSHAJII ALI·Filed 2010·Granted Sep 20, 2016·469 cites·16 claims
- 0291US9922818B2Alkyl-alkoxysilacyclic compoundsAIR PROD & CHEM·Filed 2015·Granted Mar 20, 2018·8 cites·31 claims
- 0391US6872323B1In situ plasma process to remove fluorine residues from the interior surfaces of a CVD reactorNOVELLUS SYSTEMS INC·Filed 2001·Granted Mar 29, 2005·104 cites·23 claims
- 0488US7479191B1Method for endpointing CVD chamber cleans following ultra low-k film treatmentsNOVELLUS SYSTEMS INC·Filed 2005·Granted Jan 20, 2009·20 cites·19 claims
- 0587US10249489B2Use of silyl bridged alkyl compounds for dense OSG filmsVERSUM MAT US LLC·Filed 2017·Granted Apr 2, 2019·7 cites·25 claims
- 0686US2025188605A1Compositions and Methods Using Same for Deposition of Silicon-Containing FilmVERSUM MAT US LLC·Filed 2024·Application pending·0 cites
- 0785US10106890B2Compositions and methods using same for deposition of silicon-containing filmVERSUM MAT US LLC·Filed 2015·Granted Oct 23, 2018·3 cites·9 claims
- 0879US10395920B2Alkyl-alkoxysilacyclic compoundsVERSUM MAT US LLC·Filed 2018·Granted Aug 27, 2019·2 cites·14 claims
- 0973US11158498B2Silicon compounds and methods for depositing films using sameVERSUM MAT US LLC·Filed 2019·Granted Oct 26, 2021·1 cites·17 claims
- 1072US11884689B2Alkoxysilacyclic or acyloxysilacyclic compounds and methods for depositing films using sameVERSUM MAT US LLC·Filed 2018·Granted Jan 30, 2024·1 cites·14 claims
- 1172US2024182499A1Alkoxysilacyclic or acyloxysilacyclic compounds and methods for depositing films using sameVERSUM MAT US LLC·Filed 2024·Application pending·0 cites
- 1271US7914603B2Particle trap for a plasma sourceMKS INSTR INC·Filed 2008·Granted Mar 29, 2011·2 cites·56 claims
- 1369US8999104B2Systems, methods and apparatus for separate plasma source controlSHAJII ALI·Filed 2010·Granted Apr 7, 2015·2 cites·16 claims
- 1467US9967965B2Distributed, concentric multi-zone plasma source systems, methods and apparatusLAM RES CORP·Filed 2012·Granted May 8, 2018·2 cites·18 claims
- 1565US12441747B2Silicon compounds and methods for depositing films using sameVERSUM MAT US LLC·Filed 2022·Granted Oct 14, 2025·0 cites·2 claims
- 1663US12049695B2Compositions and methods using same for deposition of silicon-containing filmVERSUM MAT US LLC·Filed 2018·Granted Jul 30, 2024·0 cites·12 claims
- 1763US10283325B2Distributed multi-zone plasma source systems, methods and apparatusSHAJII ALI·Filed 2012·Granted May 7, 2019·1 cites·16 claims
- 1863US2020048286A1Silicon compounds and methods for depositing films using sameVERSUM MAT US LLC·Filed 2019·Application pending·0 cites
- 1963US2022044928A1Silicon compounds and methods for depositing films using sameVERSUM MAT US LLC·Filed 2021·Application pending·0 cites
- 2058US9155181B2Distributed multi-zone plasma source systems, methods and apparatusSHAJII ALI·Filed 2010·Granted Oct 6, 2015·1 cites·12 claims
- 2156US2022388033A1Precursors for depositing films with high elastic modulusVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 2256US2018228015A1Distributed, Non-Concentric Multi-Zone Plasma Source Systems, Methods and ApparatusLAM RES CORP·Filed 2018·Application pending·0 cites
- 2352US2024240309A1New Precursors For Depositing Films With High Elastic ModulusVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 2452US2020165727A11-Methyl-1-Iso-Propoxy-Silacycloalkanes And Dense Organosilica Films Made TherefromVERSUM MAT US LLC·Filed 2019·Application pending·0 cites
- 2551US10424460B2Systems, methods and apparatus for choked flow element extractionLAM RES CORP·Filed 2016·Granted Sep 24, 2019·0 cites·14 claims
- 2650US2023386825A1Alkoxydisiloxanes and dense organosilica films made therefromVERSUM MAT US LLC·Filed 2021·Application pending·0 cites
- 2747US2008302652A1Particle Reduction Through Gas and Plasma Source ControlMKS INSTR INC·Filed 2008·Application pending·0 cites
- 2846US2022301862A1Monoalkoxysilanes and dense organosilica films made therefromVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 2946US2024052490A1Monoalkoxysilanes and dialkoxysilanes and dense organosilica films made therefromVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 3045US2022293417A1Silicon compounds and methods for depositing films using sameVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 3142US11164739B2Use of silicon structure former with organic substituted hardening additive compounds for dense OSG filmsVERSUM MAT US LLC·Filed 2019·Granted Nov 2, 2021·0 cites·17 claims
- 3234US2018047898A1Process for depositing porous organosilicate glass films for use as resistive random access memoryVERSUM MAT US LLC·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →