Inventor · disambiguated record
Yasuharu Sasaki
Also filed as: SASAKI YASUHARU
71 granted patents·27 pending applications·2,049 citations·filing 2000–2025
99Inventor score
Top patents by PatentIndex Score
98 records- 0199USD803802SElectrostatic chuck for semiconductor manufacturing equipmentTOKYO ELECTRON LTD·Filed 2016·Granted Nov 28, 2017·285 cites·1 claims
- 0299USD802472SElectrostatic chuck for semiconductor manufacturing equipmentTOKYO ELECTRON LTD·Filed 2016·Granted Nov 14, 2017·280 cites·1 claims
- 0399USD795208SElectrostatic chuck for semiconductor manufacturing equipmentTOKYO ELECTRON LTD·Filed 2016·Granted Aug 22, 2017·445 cites·1 claims
- 0497USD496008SExhaust ring for manufacturing semiconductorsTOKYO ELECTRON LTD·Filed 2003·Granted Sep 14, 2004·441 cites·1 claims
- 0596US11908666B2Stage and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Feb 20, 2024·3 cites·20 claims
- 0696US7033444B1Plasma processing apparatus, and electrode structure and table structure of processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Apr 25, 2006·129 cites·20 claims
- 0793USD587222SAttracting plate of an electrostatic chuck for semiconductor manufacturingTOKYO ELECTRON LTD·Filed 2007·Granted Feb 24, 2009·55 cites·1 claims
- 0893US7337745B1Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptorTOKYO ELECTRON LTD·Filed 2000·Granted Mar 4, 2008·83 cites·7 claims
- 0993US6955912B2Process for producing Trichoderma harzianum ferm BP-4346HOKKAIDO GREEN KOSAN INC·Filed 2004·Granted Oct 18, 2005·110 cites·1 claims
- 1092US11935729B2Substrate support and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Mar 19, 2024·2 cites·7 claims
- 1192US11923171B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2022·Granted Mar 5, 2024·2 cites·9 claims
- 1292US11830751B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Nov 28, 2023·2 cites·12 claims
- 1391US8981263B2Electrostatic chuck apparatusSASAKI YASUHARU·Filed 2010·Granted Mar 17, 2015·15 cites·11 claims
- 1490US8043971B2Plasma processing apparatus, ring member and plasma processing methodTOKYO ELECTRON LTD·Filed 2008·Granted Oct 25, 2011·13 cites·18 claims
- 1590US7646581B2Electrostatic chuckSUMITOMO OSAKA CEMENT CO LTD·Filed 2007·Granted Jan 12, 2010·16 cites·11 claims
- 1689US11894218B2Electrostatic chuck, support platform, and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Feb 6, 2024·2 cites·19 claims
- 1788US8252132B2Method and apparatus for repairing an electrostatic chuck device, and the electrostatic chuck deviceYOSHIOKA KEN·Filed 2010·Granted Aug 28, 2012·9 cites·9 claims
- 1888US7582491B2Method for diagnosing electrostatic chuck, vacuum processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted Sep 1, 2009·16 cites·16 claims
- 1986USD992614SFocus ringTOKYO ELECTRON LTD·Filed 2019·Granted Jul 18, 2023·24 cites·1 claims
- 2086US8696862B2Substrate mounting table, substrate processing apparatus and substrate temperature control methodSASAKI YASUHARU·Filed 2009·Granted Apr 15, 2014·11 cites·14 claims
- 2183US11437223B2Stage and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Sep 6, 2022·1 cites·9 claims
- 2282US12293903B2Substrate support and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Granted May 6, 2025·0 cites·12 claims
- 2382US12272528B2Stage and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Granted Apr 8, 2025·0 cites·20 claims
- 2482USD992615SFocus ringTOKYO ELECTRON LTD·Filed 2019·Granted Jul 18, 2023·25 cites·1 claims
- 2581US12046457B2Electrostatic chuck, focus ring, support base, plasma processing apparatus, and plasma processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Jul 23, 2024·2 cites·16 claims
- 2681US10410902B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Sep 10, 2019·3 cites·2 claims
- 2780US9721822B2Electrostatic chuck apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Aug 1, 2017·3 cites·20 claims
- 2880US2025132136A1Substrate support and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2979US11538668B2Mounting stage, substrate processing device, and edge ringTOKYO ELECTRON LTD·Filed 2019·Granted Dec 27, 2022·2 cites·10 claims
- 3079US8823404B2Evaluation device and evaluation method for substrate mounting apparatus and evaluation substrate used for the sameSASAKI YASUHARU·Filed 2011·Granted Sep 2, 2014·4 cites·16 claims
- 3179US2025329519A1Mounting base, substrate processing device, edge ring, and edge ring transfer methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 3278US11664200B2Placing table, positioning method of edge ring and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted May 30, 2023·2 cites·11 claims
- 3378US9412635B2Electrostatic chuck deviceTOKYO ELECTRON LTD·Filed 2013·Granted Aug 9, 2016·4 cites·5 claims
- 3478US6753295B1Plant activator, process for producing the same, activation method, activity promoter and method for applying the promoterSASAKI YASUHARU·Filed 2000·Granted Jun 22, 2004·6 cites·2 claims
- 3577US10388558B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Aug 20, 2019·2 cites·7 claims
- 3677US8950469B2Temperature control system and temperature control method for substrate mounting tableSASAKI YASUHARU·Filed 2010·Granted Feb 10, 2015·4 cites·6 claims
- 3777US8573836B2Apparatus and method for evaluating a substrate mounting deviceSASAKI YASUHARU·Filed 2007·Granted Nov 5, 2013·6 cites·8 claims
- 3877USD570310SAttracting plate of an electrostatic chuck for semiconductor manufacturingTOKYO ELECTRON LTD·Filed 2007·Granted Jun 3, 2008·22 cites·1 claims
- 3976US10886108B2Power feed structure and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Jan 5, 2021·1 cites·8 claims
- 4076US8512511B2Mounting table and plasma processing apparatusHIMORI SHINJI·Filed 2009·Granted Aug 20, 2013·5 cites·21 claims
- 4175US2024347322A1Electrostatic chuck, focus ring, support base, plasma processing apparatus, and plasma processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 4274US11004717B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2018·Granted May 11, 2021·1 cites·12 claims
- 4373US9589823B2Mounting table and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Mar 7, 2017·4 cites·12 claims
- 4472US11037815B2Dechuck control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jun 15, 2021·1 cites·12 claims
- 4572US10591194B2Temperature control methodTOKYO ELECTRON LTD·Filed 2017·Granted Mar 17, 2020·1 cites·3 claims
- 4672US2022375777A1Structure of mounting table and semiconductor processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 4770US10541158B2Temperature adjustment method using wet surface in a processing chamberTOKYO ELECTRON LTD·Filed 2017·Granted Jan 21, 2020·1 cites·3 claims
- 4868US2023298865A1Substrate support assembly, plasma processing apparatus, and plasma processing methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 4967US11521886B2Substrate processing apparatus and substrate supportTOKYO ELECTRON LTD·Filed 2020·Granted Dec 6, 2022·0 cites·16 claims
- 5064US9017786B2Method and apparatus for repairing an electrostatic chuck device, and the electrostatic chuck deviceYOSHIOKA KEN·Filed 2012·Granted Apr 28, 2015·1 cites·11 claims
Showing the top 50 of 98 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →