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US11404381B2ActiveUtilityPatentIndex 73

Chip package with fan-out structure

Assignee: TAIWAN SEMICONDUCTOR MFG CO LTDPriority: Oct 13, 2016Filed: Dec 23, 2019Granted: Aug 2, 2022
Est. expiryOct 13, 2036(~10.3 yrs left)· nominal 20-yr term from priority
Inventors:CHEN SHING-CHAOLIN CHIH-WEICHIANG TSUNG-HSIENCHENG MING-DAHSIEH CHING-HUA
H10P 72/7436H10P 72/7424H10P 72/744H10P 72/743H10P 72/74H10W 90/734H10W 90/724H10W 90/722H10W 90/701H10W 74/117H10W 74/019H10W 72/9413H10W 72/874H10W 72/241H10W 72/0198H10W 72/073H10W 70/099H10W 90/00H10W 74/017H10W 74/014H10W 70/685H10W 70/635H10W 70/614H10W 70/095H10W 70/60H10W 70/09H10W 70/05H10W 70/611H10W 70/65B29C 45/14639H01L 2221/68359H01L 2924/13091H01L 21/6835H01L 2924/1304H01L 2924/00012H01L 2924/1431H01L 23/5383H01L 2224/97H01L 21/486H01L 25/50H01L 2224/12105H01L 2221/68381H01L 24/20H01L 25/0657H01L 2224/81H01L 23/49827H01L 23/49816H01L 2221/68372H01L 2224/32225H01L 23/5389H01L 25/105H01L 2924/1203H01L 2225/1058H01L 23/5384H01L 24/19H01L 2224/16227H01L 2225/1035H01L 2224/18H01L 21/561H01L 24/18H01L 23/5386H01L 2224/04105H01L 21/568H01L 2221/68345H01L 23/3128H01L 2224/83H01L 2225/1041H01L 2224/24227H01L 2224/92244H01L 21/4857H01L 21/566H01L 2224/73267
73
PatentIndex Score
2
Cited by
25
References
20
Claims

Abstract

A chip package is provided. The chip package includes a semiconductor die and a protection layer surrounding the semiconductor die. The chip package also includes a first dielectric layer over the semiconductor die and the protection layer. The first dielectric layer has an upper surface with cutting scratches. The chip package further includes a conductive layer over the first dielectric layer. In addition, the chip package includes a second dielectric layer over the conductive layer and filling some of the cutting scratches. Bottoms of the cutting scratches are positioned at height levels that are lower than a topmost surface of the first dielectric layer and higher than a topmost surface of the semiconductor die.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A chip package, comprising:
 a semiconductor die; 
 a protection layer surrounding the semiconductor die; 
 a first dielectric layer over the semiconductor die and the protection layer, wherein the first dielectric layer has an upper surface with cutting scratches; 
 a conductive layer over the first dielectric layer, wherein the conductive layer extends across a first plurality of the cutting scratches; and 
 a second dielectric layer over the conductive layer and filling a second plurality of the cutting scratches, wherein bottoms of the second plurality of the cutting scratches are positioned at height levels that are lower than a topmost surface of the first dielectric layer and higher than a topmost surface of the semiconductor die. 
 
     
     
       2. The chip package as claimed in  claim 1 , further comprising a conductive structure in the protection layer and separated from the semiconductor die by a portion of the protection layer, wherein the protection layer has a recessed portion between the semiconductor die and the conductive structure. 
     
     
       3. The chip package as claimed in  claim 2 , wherein the first dielectric layer fills the recessed portion of the protection layer. 
     
     
       4. The chip package as claimed in  claim 2 , wherein a top surface of the conductive structure is between the topmost surface of the first dielectric layer and a bottommost surface of the first dielectric layer. 
     
     
       5. The chip package as claimed in  claim 1 , wherein an interface between the second dielectric layer and the first dielectric layer has an undulate morphology. 
     
     
       6. The chip package as claimed in  claim 1 , wherein widths of the cutting scratches are substantially the same. 
     
     
       7. The chip package as claimed in  claim 1 , wherein each of the cutting scratches has a width in a range from about 20 μm to about 60 μm, and each of the cutting scratches has a depth in a range from about 0.05 μm to about 0.1 μm. 
     
     
       8. The chip package as claimed in  claim 1 , wherein the conductive layer fills the first plurality of the cutting scratches. 
     
     
       9. The chip package as claimed in  claim 1 , wherein intervals between the cutting scratches are substantially the same. 
     
     
       10. The chip package as claimed in  claim 1 , wherein the second dielectric layer is in direct contact with sidewalls of second plurality of the cutting scratches. 
     
     
       11. A chip package, comprising:
 a semiconductor die; 
 a protection layer surrounding the semiconductor die; 
 a first dielectric layer over the semiconductor die and the protection layer; 
 a conductive layer over the first dielectric layer, wherein a topmost surface of the conductive layer is higher than a topmost surface of the first dielectric layer; and 
 a second dielectric layer over the first dielectric layer and the conductive layer, wherein the second dielectric layer has a plurality of protruding portions extending into the first dielectric layer, bottoms of the protruding portions are positioned at height levels that are lower than the topmost surface of the first dielectric layer and higher than a topmost surface of the semiconductor die, and a topmost surface of the second dielectric layer is higher than a topmost surface of the conductive layer. 
 
     
     
       12. The chip package as claimed in  claim 11 , wherein widths of the protruding portions of the second dielectric layer are substantially the same. 
     
     
       13. The chip package as claimed in  claim 11 , wherein each of the protruding portions of the second dielectric layer has a width in a range from about 20 μm to about 60 μm, and each of the protruding portions of the conductive layer has a height in a range from about 0.05 μm to about 0.1 μm. 
     
     
       14. The chip package as claimed in  claim 11 , wherein the conductive layer has a plurality of second protruding portions extending into the first dielectric layer. 
     
     
       15. The chip package as claimed in  claim 14 , wherein a width of each of the protruding portions of the second dielectric layer is substantially equal to a width of each of the second protruding portions of the conductive layer. 
     
     
       16. A chip package, comprising:
 a semiconductor die; 
 a protection layer surrounding the semiconductor die; 
 a first dielectric layer over the semiconductor die and the protection layer; and 
 a conductive layer over the first dielectric layer, wherein a topmost surface of the conductive layer is higher than a topmost surface of the first dielectric layer; and 
 a second dielectric layer over the first dielectric layer and the conductive layer, wherein an interface between the second dielectric layer and the first dielectric layer has an undulate morphology, bottoms of the interface with the undulated morphology are positioned at height levels that are lower than the topmost surface of the first dielectric layer and higher than a topmost surface of the semiconductor die, and a topmost surface of the second dielectric layer is higher than a topmost surface of the conductive layer. 
 
     
     
       17. The chip package as claimed in  claim 16 , wherein an interface between the conductive layer and the first dielectric layer has a second undulate morphology. 
     
     
       18. The chip package as claimed in  claim 17 , wherein the undulate morphology and the second undulate morphology are substantially the same. 
     
     
       19. The chip package as claimed in  claim 16 , further comprising a conductive structure in the protection layer and separated from the semiconductor die by a portion of the protection layer, wherein the protection layer has a recessed portion between the semiconductor die and the conductive structure. 
     
     
       20. The chip package as claimed in  claim 16 , further comprising a conductive structure in the protection layer and separated from the semiconductor die by a portion of the protection layer, wherein a top surface of the conductive structure is between the topmost surface of the first dielectric layer and a bottommost surface of the first dielectric layer.

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