US8787076B2ActiveUtilityPatentIndex 52
Magnetic memory and method of manufacturing the same
Est. expirySep 2, 2028(~2.2 yrs left)· nominal 20-yr term from priority
G11C 19/0841G11C 11/1659G11C 11/1675G11C 19/0808G11C 11/1673G11C 11/161G11C 11/1655H10B 61/22H10N 50/10
52
PatentIndex Score
1
Cited by
31
References
11
Claims
Abstract
A magnetic memory according to the present invention has: a first underlayer; a second underlayer so formed on the first underlayer as to be in contact with the first underlayer; and a data storage layer so formed on the second underlayer as to be in contact with the second underlayer. The data storage layer is made of a ferromagnetic material having perpendicular magnetic anisotropy. A magnetization state of the data storage layer is changed by current driven domain wall motion.
Claims
exact text as granted — not AI-modifiedThe invention claimed is:
1. A magnetic memory comprising:
a first underlayer;
a second underlayer formed on said first underlayer so as to be in contact with said first underlayer; and
a data storage layer formed on said second underlayer so as to be in contact with said second underlayer,
wherein said data storage layer is a Co/Ni laminated film having perpendicular magnetic anisotropy and has an fcc(111) orientation crystal structure, and
a magnetization state of said data storage layer is changed by current driven domain wall motion.
2. The magnetic memory according to claim 1 ,
wherein said first underlayer includes a fourth to sixth group element, and
said second underlayer includes a ninth to eleventh group element.
3. The magnetic memory according to claim 2 ,
wherein a film thickness of said first underlayer is not less than 1 nm and not more than 10 nm.
4. The magnetic memory according to claim 2 ,
wherein a film thickness of said second underlayer is not less than 1.1 nm and not more than 3 nm.
5. The magnetic memory according to claim 1 ,
wherein said first underlayer includes any of Ti, Zr, Nb, Mo, Hf, Ta and W or alloy consisting of a plurality of materials selected from Ti, Zr, Nb, Mo, Hf, Ta and W.
6. The magnetic memory according to claim 5 ,
wherein said first underlayer includes at least Ta.
7. The magnetic memory according to claim 1 ,
wherein said second underlayer includes any of Cu, Rh, Pd, Ag, Ir, Pt and Au or alloy consisting of a plurality of materials selected from Cu, Rh, Pd, Ag, Ir, Pt and Au.
8. The magnetic memory according to claim 7 ,
wherein said second underlayer includes at least one material of Pt and Pd.
9. The magnetic memory according to claim 1 , wherein said data storage layer comprises at least two Co/Ni laminated films.
10. The magnetic memory according to claim 9 , wherein said at least two CO/Ni laminated films comprise a first layer which includes Co and a second layer which includes Ni, and
wherein the first layer is formed on a side of the at least two Co/Ni laminated films which is directed to that second underlayer.
11. The magnetic memory according to claim 9 , wherein the second layer is formed on an upper side of the first layer.Cited by (0)
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