Inventor · disambiguated record
Rick Endo
Also filed as: ENDO RICK · ENDO RICK R
18 granted patents·12 pending applications·96 citations·filing 2001–2014
93Inventor score
Top patents by PatentIndex Score
30 records- 0195US7334588B2Method and apparatus for wafer cleaningAPPLIED MATERIALS INC·Filed 2006·Granted Feb 26, 2008·26 cites·31 claims
- 0289US8770143B2Multi-region processing systemENDO RICK·Filed 2011·Granted Jul 8, 2014·19 cites·13 claims
- 0386US8039052B2Multi-region processing system and headsINTERMOLECULAR INC·Filed 2007·Granted Oct 18, 2011·5 cites·9 claims
- 0486US7993461B2Method and system for mask handling in high productivity chamberINTERMOLECULAR INC·Filed 2007·Granted Aug 9, 2011·8 cites·13 claims
- 0585US7819985B2Method and apparatus for wafer cleaningAPPLIED MATERIALS INC·Filed 2006·Granted Oct 26, 2010·6 cites·16 claims
- 0676US8486821B1Method and apparatus for variable conductanceENDO RICK·Filed 2012·Granted Jul 16, 2013·2 cites·5 claims
- 0774US8317925B2Method and system for mask handling in high productivity chamberENDO RICK·Filed 2011·Granted Nov 27, 2012·2 cites·19 claims
- 0874US7836901B2Method and apparatus for wafer cleaningAPPLIED MATERIALS INC·Filed 2007·Granted Nov 23, 2010·3 cites·8 claims
- 0972US8771483B2Combinatorial process systemENDO RICK·Filed 2008·Granted Jul 8, 2014·2 cites·15 claims
- 1072US8449678B2Combinatorial process systemENDO RICK·Filed 2008·Granted May 28, 2013·2 cites·18 claims
- 1171US8216376B1Method and apparatus for variable conductanceENDO RICK·Filed 2009·Granted Jul 10, 2012·3 cites·11 claims
- 1271US7451774B2Method and apparatus for wafer cleaningAPPLIED MATERIALS INC·Filed 2001·Granted Nov 18, 2008·11 cites·17 claims
- 1371US2014311408A1Multi-Region Processing System and HeadsINTERMOLECULAR INC·Filed 2014·Application pending·0 cites
- 1470US8932995B2Combinatorial process systemENDO RICK·Filed 2011·Granted Jan 13, 2015·1 cites·11 claims
- 1570US8387563B2Combinatorial process systemENDO RICK·Filed 2012·Granted Mar 5, 2013·1 cites·9 claims
- 1669US7290976B2Semiconductor substrate processing apparatus with a passive substrate gripperAPPLIED MATERIALS INC·Filed 2005·Granted Nov 6, 2007·3 cites·15 claims
- 1761US2015093898A1Combinatorial Process SystemINTERMOLECULAR INC·Filed 2014·Application pending·0 cites
- 1858US8758581B2Combinatorial process systemENDO RICK·Filed 2008·Granted Jun 24, 2014·0 cites·6 claims
- 1956US2009026150A1Method and apparatus for chemical mixing in a single wafer processVERHAVERBEKE STEVEN·Filed 2008·Application pending·0 cites
- 2055US8500908B2Method and system for mask handling in high productivity chamberINTERMOLECULAR INC·Filed 2012·Granted Aug 6, 2013·0 cites·10 claims
- 2155US2008047582A1Method and apparatus for wafer cleaningVERHAVERBEKE STEVEN·Filed 2007·Application pending·0 cites
- 2255US2008083436A1Method and apparatus for wafer cleaningVERHAVERBEKE STEVEN·Filed 2007·Application pending·0 cites
- 2355US2008083437A1Method and apparatus for wafer cleaningVERHAVERBEKE STEVEN·Filed 2007·Application pending·0 cites
- 2454US2009020144A1Method and apparatus for cleaning a substrateVERHAVERBEKE STEVEN·Filed 2008·Application pending·0 cites
- 2553US7205023B2Method and apparatus for chemical mixing in a single wafer processAPPLIED MATERIALS INC·Filed 2001·Granted Apr 17, 2007·2 cites·14 claims
- 2652US2006264050A1Method and apparatus for chemical mixing in a single wafer processVERHAVERBEKE STEVEN·Filed 2006·Application pending·0 cites
- 2752US2006266387A1Method and apparatus for wafer cleaningVERHAVERBEKE STEVEN·Filed 2006·Application pending·0 cites
- 2850US2007246081A1Methods and apparatus for cleaning a substrateLU WEI·Filed 2007·Application pending·0 cites
- 2940US2006027248A1Megasonic cleaning with minimized interferenceAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 3036US2002066475A1Chuck for holding waferFiled 2001·Application pending·0 cites
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