Inventor · disambiguated record
Dien-Yeh Wu
Also filed as: WU DIEN-YEH · WU DIEN-YEH DANIEL
62 granted patents·19 pending applications·3,260 citations·filing 2001–2024
99Inventor score
Top patents by PatentIndex Score
81 records- 0198USRE47440EApparatus and method for providing uniform flow of gasAPPLIED MATERIALS INC·Filed 2017·Granted Jun 18, 2019·360 cites·31 claims
- 0298US7780789B2Vortex chamber lids for atomic layer depositionAPPLIED MATERIALS INC·Filed 2007·Granted Aug 24, 2010·458 cites·24 claims
- 0398US7591907B2Apparatus for hybrid chemical processingAPPLIED MATERIALS INC·Filed 2008·Granted Sep 22, 2009·375 cites·20 claims
- 0498US7402210B2Apparatus and method for hybrid chemical processingAPPLIED MATERIALS INC·Filed 2007·Granted Jul 22, 2008·61 cites·13 claims
- 0598US7270709B2Method and apparatus of generating PDMAT precursorAPPLIED MATERIALS INC·Filed 2005·Granted Sep 18, 2007·50 cites·20 claims
- 0698US7204886B2Apparatus and method for hybrid chemical processingAPPLIED MATERIALS INC·Filed 2003·Granted Apr 17, 2007·525 cites·20 claims
- 0798US6916398B2Gas delivery apparatus and method for atomic layer depositionAPPLIED MATERIALS INC·Filed 2001·Granted Jul 12, 2005·646 cites·21 claims
- 0898US6905541B2Method and apparatus of generating PDMAT precursorAPPLIED MATERIALS INC·Filed 2003·Granted Jun 14, 2005·119 cites·32 claims
- 0997US11715667B2Thermal process chamber lid with backside pumpingAPPLIED MATERIALS INC·Filed 2022·Granted Aug 1, 2023·5 cites·10 claims
- 1097US8070879B2Apparatus and method for hybrid chemical processingCHEN LING·Filed 2009·Granted Dec 6, 2011·29 cites·11 claims
- 1197US7228873B2Valve design and configuration for fast delivery systemAPPLIED MATERIALS INC·Filed 2006·Granted Jun 12, 2007·61 cites·45 claims
- 1296US11555244B2High temperature dual chamber showerheadAPPLIED MATERIALS INC·Filed 2020·Granted Jan 17, 2023·4 cites·20 claims
- 1396US8668776B2Gas delivery apparatus and method for atomic layer depositionCHEN LING·Filed 2010·Granted Mar 11, 2014·21 cites·14 claims
- 1496US7699023B2Gas delivery apparatus for atomic layer depositionAPPLIED MATERIALS INC·Filed 2007·Granted Apr 20, 2010·34 cites·20 claims
- 1596US7682946B2Apparatus and process for plasma-enhanced atomic layer depositionAPPLIED MATERIALS INC·Filed 2006·Granted Mar 23, 2010·40 cites·33 claims
- 1696US7597758B2Chemical precursor ampoule for vapor deposition processesAPPLIED MATERIALS INC·Filed 2007·Granted Oct 6, 2009·16 cites·20 claims
- 1795US7850779B2Apparatus and process for plasma-enhanced atomic layer depositionAPPLIED MATERISALS INC·Filed 2006·Granted Dec 14, 2010·69 cites·6 claims
- 1895US7066194B2Valve design and configuration for fast delivery systemAPPLIED MATERIALS INC·Filed 2002·Granted Jun 27, 2006·61 cites·21 claims
- 1994US7775508B2Ampoule for liquid draw and vapor draw with a continuous level sensorAPPLIED MATERIALS INC·Filed 2006·Granted Aug 17, 2010·28 cites·23 claims
- 2093US7780785B2Gas delivery apparatus for atomic layer depositionAPPLIED MATERIALS INC·Filed 2002·Granted Aug 24, 2010·61 cites·26 claims
- 2193US7780788B2Gas delivery apparatus for atomic layer depositionAPPLIED MATERIALS INC·Filed 2005·Granted Aug 24, 2010·17 cites·62 claims
- 2292US6955211B2Method and apparatus for gas temperature control in a semiconductor processing systemAPPLIED MATERIALS INC·Filed 2002·Granted Oct 18, 2005·70 cites·19 claims
- 2391US10982326B2Counter-flow multi inject for atomic layer deposition chamberAPPLIED MATERIALS INC·Filed 2019·Granted Apr 20, 2021·3 cites·18 claims
- 2491US8955547B2Apparatus and method for providing uniform flow of gasAPPLIED MATERIALS INC·Filed 2013·Granted Feb 17, 2015·15 cites·20 claims
- 2590US11335591B2Thermal process chamber lid with backside pumpingAPPLIED MATERIALS INC·Filed 2020·Granted May 17, 2022·2 cites·11 claims
- 2689US10487399B2Atomic layer deposition chamber with counter-flow multi injectAPPLIED MATERIALS INC·Filed 2015·Granted Nov 26, 2019·3 cites·20 claims
- 2789US10407771B2Atomic layer deposition chamber with thermal lidAPPLIED MATERIALS INC·Filed 2014·Granted Sep 10, 2019·12 cites·18 claims
- 2889US9032906B2Apparatus and process for plasma-enhanced atomic layer depositionMA PAUL·Filed 2007·Granted May 19, 2015·13 cites·20 claims
- 2989US8146896B2Chemical precursor ampoule for vapor deposition processesCUVALCI OLKAN·Filed 2008·Granted Apr 3, 2012·14 cites·25 claims
- 3087US7833358B2Method of recovering valuable material from exhaust gas stream of a reaction chamberAPPLIED MATERIALS INC·Filed 2006·Granted Nov 16, 2010·17 cites·11 claims
- 3186US9145612B2Deposition of N-metal films comprising aluminum alloysAPPLIED MATERIALS INC·Filed 2013·Granted Sep 29, 2015·3 cites·18 claims
- 3284US12230479B2Processing chamber with multiple plasma unitsAPPLIED MATERIALS INC·Filed 2024·Granted Feb 18, 2025·0 cites·5 claims
- 3384US7588736B2Apparatus and method for generating a chemical precursorAPPLIED MATERIALS INC·Filed 2006·Granted Sep 15, 2009·7 cites·51 claims
- 3483US8951478B2Ampoule with a thermally conductive coatingCHU SCHUBERT S·Filed 2007·Granted Feb 10, 2015·7 cites·19 claims
- 3583US8491967B2In-situ chamber treatment and deposition processMA PAUL F·Filed 2008·Granted Jul 23, 2013·12 cites·2 claims
- 3682US7524374B2Method and apparatus for generating a precursor for a semiconductor processing systemAPPLIED MATERIALS INC·Filed 2004·Granted Apr 28, 2009·26 cites·45 claims
- 3779US12387975B2Thermal process chamber lid with backside pumpingAPPLIED MATERIALS INC·Filed 2023·Granted Aug 12, 2025·0 cites·19 claims
- 3879US9109754B2Apparatus and method for providing uniform flow of gasAPPLIED MATERIALS INC·Filed 2012·Granted Aug 18, 2015·4 cites·26 claims
- 3978US8062422B2Method and apparatus for generating a precursor for a semiconductor processing systemCHEN LING·Filed 2009·Granted Nov 22, 2011·1 cites·20 claims
- 4077US11955319B2Processing chamber with multiple plasma unitsAPPLIED MATERIALS INC·Filed 2022·Granted Apr 9, 2024·0 cites·5 claims
- 4176US9947578B2Methods for forming low-resistance contacts through integrated process flow systemsAPPLIED MATERIALS INC·Filed 2016·Granted Apr 17, 2018·2 cites·19 claims
- 4273US10508339B2Blocker plate for use in a substrate process chamberAPPLIED MATERIALS INC·Filed 2017·Granted Dec 17, 2019·1 cites·11 claims
- 4372US9447497B2Processing chamber gas delivery system with hot-swappable ampouleWU DIEN-YEH·Filed 2014·Granted Sep 20, 2016·5 cites·11 claims
- 4471US9466524B2Method of depositing metals using high frequency plasmaAPPLIED MATERIALS INC·Filed 2013·Granted Oct 11, 2016·2 cites·15 claims
- 4570US10453657B2Apparatus for depositing metal films with plasma treatmentAPPLIED MATERIALS INC·Filed 2017·Granted Oct 22, 2019·0 cites·16 claims
- 4667US2025029816A1Heated metal lid for selective pecvdAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4766USRE48994EApparatus and method for providing uniform flow of gasAPPLIED MATERIALS INC·Filed 2019·Granted Mar 29, 2022·0 cites·33 claims
- 4866US2022319837A1Dual plasma pre-clean for selective gap fillAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4965US11133155B2Apparatus for depositing metal films with plasma treatmentAPPLIED MATERIALS INC·Filed 2019·Granted Sep 28, 2021·0 cites·12 claims
- 5064US2021159052A1Processing Chamber With Multiple Plasma UnitsAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
Showing the top 50 of 81 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →