Inventor · disambiguated record
Kunitoshi Namba
Also filed as: NAMBA KUNITOSHI
27 granted patents·1 pending application·6,484 citations·filing 1997–2022
98Inventor score
Top patents by PatentIndex Score
28 records- 0199US9607837B1Method for forming silicon oxide cap layer for solid state diffusion processASM IP HOLDING BV·Filed 2015·Granted Mar 28, 2017·473 cites·20 claims
- 0299US9464352B2Low-oxidation plasma-assisted processASM IP HOLDING BV·Filed 2014·Granted Oct 11, 2016·463 cites·14 claims
- 0399US9368352B2Methods for forming doped silicon oxide thin filmsASM INT·Filed 2014·Granted Jun 14, 2016·469 cites·19 claims
- 0499US9153441B2Methods for forming doped silicon oxide thin filmsASM INT·Filed 2014·Granted Oct 6, 2015·473 cites·17 claims
- 0599US8679958B2Methods for forming doped silicon oxide thin filmsASM INT·Filed 2012·Granted Mar 25, 2014·484 cites·26 claims
- 0698US10480064B2Reaction chamber passivation and selective deposition of metallic filmsASM IP HOLDING BV·Filed 2018·Granted Nov 19, 2019·47 cites·20 claims
- 0798US10147600B2Methods for forming doped silicon oxide thin filmsASM INT NV·Filed 2018·Granted Dec 4, 2018·417 cites·20 claims
- 0898US10041166B2Reaction chamber passivation and selective deposition of metallic filmsASM IP HOLDING BV·Filed 2017·Granted Aug 7, 2018·57 cites·20 claims
- 0998US10014212B2Selective deposition of metallic filmsASM IP HOLDING BV·Filed 2017·Granted Jul 3, 2018·397 cites·18 claims
- 1098US9875893B2Methods for forming doped silicon oxide thin filmsASM INT NV·Filed 2017·Granted Jan 23, 2018·419 cites·20 claims
- 1198US9803277B1Reaction chamber passivation and selective deposition of metallic filmsASM IP HOLDING BV·Filed 2016·Granted Oct 31, 2017·87 cites·19 claims
- 1298US9805974B1Selective deposition of metallic filmsASM IP HOLDING BV·Filed 2016·Granted Oct 31, 2017·66 cites·21 claims
- 1398US9564314B2Methods for forming doped silicon oxide thin filmsASM INT NV·Filed 2015·Granted Feb 7, 2017·465 cites·28 claims
- 1497US8394466B2Method of forming conformal film having si-N bonds on high-aspect ratio patternHONG KUO-WEI·Filed 2010·Granted Mar 12, 2013·591 cites·19 claims
- 1597US8084104B2Atomic composition controlled ruthenium alloy film formed by plasma-enhanced atomic layer depositionSHINRIKI HIROSHI·Filed 2008·Granted Dec 27, 2011·464 cites·15 claims
- 1696US10793946B1Reaction chamber passivation and selective deposition of metallic filmsASM IP HOLDING BV·Filed 2019·Granted Oct 6, 2020·17 cites·21 claims
- 1796US10410857B2Formation of SiN thin filmsASM IP HOLDING BV·Filed 2015·Granted Sep 10, 2019·13 cites·10 claims
- 1895US9899291B2Method for protecting layer by forming hydrocarbon-based extremely thin filmASM IP HOLDING BV·Filed 2015·Granted Feb 20, 2018·463 cites·16 claims
- 1995US8669185B2Method of tailoring conformality of Si-containing filmONIZAWA SHIGEYUKI·Filed 2010·Granted Mar 11, 2014·585 cites·14 claims
- 2092US10510530B2Methods for forming doped silicon oxide thin filmsASM INT NV·Filed 2018·Granted Dec 17, 2019·3 cites·18 claims
- 2191US9576790B2Deposition of boron and carbon containing materialsASM IP HOLDING BV·Filed 2015·Granted Feb 21, 2017·7 cites·26 claims
- 2289US10784105B2Methods for forming doped silicon oxide thin filmsASM INT NV·Filed 2019·Granted Sep 22, 2020·2 cites·20 claims
- 2388US11784043B2Formation of SiN thin filmsASM IP HOLDING BV·Filed 2021·Granted Oct 10, 2023·1 cites·20 claims
- 2488US11133181B2Formation of SiN thin filmsASM IP HOLDING BV·Filed 2019·Granted Sep 28, 2021·3 cites·20 claims
- 2587US11302527B2Methods for forming doped silicon oxide thin filmsASM INT NV·Filed 2020·Granted Apr 12, 2022·1 cites·20 claims
- 2681US2023031720A1Methods for forming doped silicon oxide thin filmsASM INT NV·Filed 2022·Application pending·0 cites
- 2777US8133555B2Method for forming metal film by ALD using beta-diketone metal complexSHINRIKI HIROSHI·Filed 2008·Granted Mar 13, 2012·3 cites·16 claims
- 2849US6043162AMethod of processing semiconductor substrateASM JAPAN·Filed 1997·Granted Mar 28, 2000·14 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →