Inventor · disambiguated record
Sterling Watson
Also filed as: WATSON STERLING · WATSON STERLING G
14 granted patents·9 pending applications·287 citations·filing 1997–2020
93Inventor score
Top patents by PatentIndex Score
23 records- 0195US7440093B1Apparatus and methods for providing selective defect sensitivityKLA TENCOR TECH CORP·Filed 2007·Granted Oct 21, 2008·36 cites·19 claims
- 0295US7297453B2Systems and methods for mitigating variances on a patterned wafer using a prediction modelKLA TENCOR TECH CORP·Filed 2006·Granted Nov 20, 2007·25 cites·15 claims
- 0394US6076465ASystem and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 1997·Granted Jun 20, 2000·113 cites·25 claims
- 0493US7303842B2Systems and methods for modifying a reticle's optical propertiesKLA TENCOR TECH CORP·Filed 2006·Granted Dec 4, 2007·20 cites·39 claims
- 0590US7271891B1Apparatus and methods for providing selective defect sensitivityKLA TENCOR TECH CORP·Filed 2004·Granted Sep 18, 2007·47 cites·33 claims
- 0679US9002497B2Methods and systems for inspection of wafers and reticles using designer intent dataVOLK WILLIAM·Filed 2004·Granted Apr 7, 2015·14 cites·39 claims
- 0775US10713771B2Methods and systems for inspection of wafers and reticles using designer intent dataKLA TENCOR TECH CORPORATION·Filed 2018·Granted Jul 14, 2020·1 cites·29 claims
- 0869US6731787B1System and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 2002·Granted May 4, 2004·9 cites·8 claims
- 0968US6381358B1System and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 2000·Granted Apr 30, 2002·15 cites·25 claims
- 1065US11348222B2Methods and systems for inspection of wafers and reticles using designer intent dataKLA TENCOR TECH CORPORATION·Filed 2019·Granted May 31, 2022·0 cites·30 claims
- 1157US2009324054A1System and method for determing reticle defect printabilityVACCA ANTHONY·Filed 2009·Application pending·0 cites
- 1257US2008081385A1Methods and systems for inspection of wafers and reticles using designer intent dataMARELLA PAUL F·Filed 2007·Application pending·0 cites
- 1356US2015178914A1Methods and Systems for Inspection of Wafers and Reticles Using Designer Intent DataKLA TENCOR TECH CORP·Filed 2015·Application pending·0 cites
- 1455US11557031B2Integrated multi-tool reticle inspectionKLA CORP·Filed 2020·Granted Jan 17, 2023·0 cites·45 claims
- 1554US7300729B2Method for monitoring a reticleKLA TENCOR TECH CORP·Filed 2006·Granted Nov 27, 2007·4 cites·14 claims
- 1654US2007140548A1System and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 2006·Application pending·0 cites
- 1754US2008133160A1System and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 2007·Application pending·0 cites
- 1851US7300725B2Method for determining and correcting reticle variationsKLA TENCOR TECH CORP·Filed 2006·Granted Nov 27, 2007·3 cites·13 claims
- 1946US11002597B2Solar spectrum sensor for determining value of solar spectrum based on determined average photon energyMASSACHUSETTS INST TECHNOLOGY·Filed 2017·Granted May 11, 2021·0 cites·12 claims
- 2043US2005140970A1System and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 2005·Application pending·0 cites
- 2141US2003138138A1System and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 2003·Application pending·0 cites
- 2240US2004096094A1System and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 2003·Application pending·0 cites
- 2338US2002126888A1System and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →