US11594520B2ActiveUtilityA1

Semiconductor package for thermal dissipation

73
Assignee: TAIWAN SEMICONDUCTOR MFG CO LTDPriority: Jul 1, 2014Filed: Oct 19, 2020Granted: Feb 28, 2023
Est. expiryJul 1, 2034(~8 yrs left)· nominal 20-yr term from priority
H10W 99/00H10W 90/794H10W 90/724H10W 90/721H10W 90/288H10W 90/22H10W 90/20H10W 80/211H10W 74/142H10W 74/00H10W 72/01953H10W 72/01938H10W 72/952H10W 72/823H10W 72/071H10W 70/614H10W 90/701H10W 74/117H10W 74/019H10W 70/093H10W 70/65H10W 40/228H10W 40/22H10W 90/00H01L 23/49838H01L 2225/06555H01L 24/08H01L 2924/00014H01L 23/5389H01L 2224/05647H01L 2924/15311H01L 23/3128H01L 21/568H01L 2224/9202H01L 2225/06548H01L 2224/0345H01L 2225/0652H01L 23/49816H01L 2224/80006H01L 2224/05624H01L 2924/18161H01L 23/3677H01L 24/03H01L 21/4853H01L 2224/80904H01L 25/105H01L 2924/00012H01L 2924/181H01L 23/49811H01L 25/16H01L 24/05H01L 25/0657H01L 2224/0361H01L 24/80H01L 2225/06517H01L 2225/06572H01L 23/3675H01L 2224/08225H01L 2225/06589
73
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Cited by
130
References
20
Claims

Abstract

A first package is bonded to a first substrate with first external connections and second external connections. The second external connections are formed using materials that are different than the first external connections in order to provide a thermal pathway from the first package. In a particular embodiment the first external connections are solder balls and the second external connections are copper blocks.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A method of manufacturing a semiconductor device, the method comprising:
 forming a first set of external connections on a front side of an interconnect structure of a first package, wherein the first set of external connections are on first contact pads in a signal region of the first package; and 
 placing a second set of external connections on the front side of the interconnect structure, wherein the second set of external connections are on second contact pads in a power/ground region of the first package, and wherein the second set of external connections are formed of a different material that has a higher thermal conductivity than a material of the first set of external connections. 
 
     
     
       2. The method of  claim 1 , wherein the second set of external connections comprise conductive blocks. 
     
     
       3. The method of  claim 2 , wherein the second set of external connections comprise copper. 
     
     
       4. The method of  claim 1  further comprising bonding the first package to a substrate using the first set of external connections and the second set of external connections to electrically and thermally connect the first package and the substrate, wherein the second set of external connections are attached to the second contact pads by first solder regions, wherein bonding the first package to the substrate comprises attaching the second set of external connections to third contact pads of the substrate through second solder regions, and wherein each of the first solder regions and each of the second solder regions are disposed on opposing surfaces of a corresponding one of the second set of external connections. 
     
     
       5. The method of  claim 4 , wherein the substrate is a printed circuit board. 
     
     
       6. The method of  claim 4 , wherein placing the second set of external connections further comprises applying solder flux between the second contact pads of the interconnect structure and the second set of external connections. 
     
     
       7. The method of  claim 1 , wherein placing the second set of external connections further comprises placing copper foil on the front side of the interconnect structure. 
     
     
       8. The method of  claim 1 , wherein placing the second set of external connections further comprises placing a conductive paste on the front side of the interconnect structure. 
     
     
       9. The method of  claim 1  further comprising bonding the first package to a second package using a third set of external connections, wherein a material of the first set of external connections and the third set of external connections are the same. 
     
     
       10. A method of manufacturing a semiconductor device, the method comprising:
 bonding a first package to a second package using a first set of external connections; and 
 bonding an interconnect structure of the second package to a substrate using a second set of external connections on a signal region of the second package and a third set of external connections on a power/ground region of the second package, wherein a material of the second set of external connections is different from a material of the third set of external connections, and wherein the third set of external connections comprise openings within the third set of external connections. 
 
     
     
       11. The method of  claim 10 , wherein bonding the interconnect structure of the second package to the substrate using the second set of external connections comprises reflowing the second set of external connections. 
     
     
       12. The method of  claim 10 , wherein the material of the third set of external connections has a higher thermal conductivity than the material of the second set of external connections. 
     
     
       13. The method of  claim 10 , wherein the third set of external connections comprise a copper block. 
     
     
       14. The method of  claim 10 , wherein the third set of external connections comprise a shape that is a circle, polygon, star, cross, or a U-shape in a top down view. 
     
     
       15. The method of  claim 10 , wherein the third set of external connections comprise a plurality of conductive blocks having different widths. 
     
     
       16. A method of manufacturing a semiconductor device, the method comprising:
 forming vias on a carrier substrate; 
 positioning a semiconductor die on the carrier substrate adjacent to the vias; 
 replacing the carrier substrate with an interconnect structure to form a package; and 
 forming a first set of external connections and a second set of external connections on a front side of the interconnect structure, wherein the first set of external connections are on a signal region of the package and the second set of external connections are on a power/ground region of the package, wherein a thermal conductivity of the second set of external connections is higher than that of the first set of external connections. 
 
     
     
       17. The method of  claim 16 , wherein the second set of external connections are surrounded by the first set of external connections. 
     
     
       18. The method of  claim 16 , wherein the second set of external connections comprise a conductive ball. 
     
     
       19. The method of  claim 16 , wherein at least portion of the second set of external connections are located does not overlap the semiconductor die. 
     
     
       20. The method of  claim 16 , wherein the second set of external connections comprise openings within the second set of external connections.

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