P

Inventor

KOSUGI TETSUYA

JP39 patents
⚠️ This page may combine multiple inventors who share the name “KOSUGI TETSUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI INT ELECTRIC INC

17 patents
USD826185SAug 21, 2018

Ceiling heater for substrate processing apparatus

HITACHI INT ELECTRIC INC24 citations94
USD825501SAug 14, 2018

Air flow controller for heater of substrate processing apparatus

HITACHI INT ELECTRIC INC6 citations84
USD824440SJul 31, 2018

Heater of substrate processing apparatus

HITACHI INT ELECTRIC INC7 citations83
USD825502SAug 14, 2018

Heater for substrate processing apparatus

HITACHI INT ELECTRIC INC2 citations73
US9695511B2Jul 4, 2017

Substrate processing apparatus, method of manufacturing semiconductor device and method of processing substrate

HITACHI INT ELECTRIC INC3 citations73
US10340151B2Jul 2, 2019

Substrate processing apparatus, heating apparatus, ceiling heat insulator, and method of manufacturing semiconductor device

HITACHI INT ELECTRIC INC2 citations72
USD823363SJul 17, 2018

Heater of substrate processing apparatus

HITACHI INT ELECTRIC INC5 citations72
USD803075SNov 21, 2017

Thermometry tool for substrate processing apparatus

HITACHI INT ELECTRIC INC2 citations72
US9587884B2Mar 7, 2017

Insulation structure and method of manufacturing semiconductor device

HITACHI INT ELECTRIC INC2 citations72
USD819463SJun 5, 2018

Protector tube for thermocouple

HITACHI INT ELECTRIC INC2 citations71
USD818850SMay 29, 2018

Protector tube for thermocouple

HITACHI INT ELECTRIC INC4 citations71
US10415136B2Sep 17, 2019

Substrate processing apparatus including heating and cooling device, and ceiling part included in the same

HITACHI INT ELECTRIC INC1 citations62
US10228291B2Mar 12, 2019

Substrate processing apparatus, and thermocouple

HITACHI INT ELECTRIC INC1 citations62
US9449849B2Sep 20, 2016

Method of manufacturing semiconductor device using meander-shaped heating element

HITACHI INT ELECTRIC INC2 citations62
US10418293B2Sep 17, 2019

Substrate processing apparatus, method of manufacturing semiconductor device, and thermocouple support

HITACHI INT ELECTRIC INC0 citations52
US9269638B2Feb 23, 2016

Temperature detecting apparatus, substrate processing apparatus and method of manufacturing semiconductor device

HITACHI INT ELECTRIC INC0 citations52
US10684174B2Jun 16, 2020

Substrate processing apparatus, and thermocouple

HITACHI INT ELECTRIC INC0 citations51

KOKUSAI ELECTRIC CORP

16 patents
USD918848SMay 11, 2021

Retainer of ceiling heater for semiconductor fabrication apparatus

KOKUSAI ELECTRIC CORP12 citations85
USD980177SMar 7, 2023

Ceiling heater for substrate processing apparatus

KOKUSAI ELECTRIC CORP7 citations82
USD959393SAug 2, 2022

Ceiling heater for substrate processing apparatus

KOKUSAI ELECTRIC CORP7 citations82
US11043402B2Jun 22, 2021

Cooling unit, heat insulating structure, and substrate processing apparatus

KOKUSAI ELECTRIC CORP4 citations73
USD860420SSep 17, 2019

Electric furnace for substrate processing apparatus

KOKUSAI ELECTRIC CORP3 citations73
USD860419SSep 17, 2019

Electric furnace for substrate processing apparatus

KOKUSAI ELECTRIC CORP3 citations73
US12050138B2Jul 30, 2024

Substrate processing apparatus, and thermocouple

KOKUSAI ELECTRIC CORP2 citations72
USD976129SJan 24, 2023

Temperature sensor

KOKUSAI ELECTRIC CORP3 citations72
USD962183SAug 30, 2022

Retainer plate of top heater for wafer processing furnace

KOKUSAI ELECTRIC CORP5 citations72
USD962184SAug 30, 2022

Retainer plate of top heater for wafer processing furnace

KOKUSAI ELECTRIC CORP5 citations72
US11300456B2Apr 12, 2022

Substrate processing apparatus, and thermocouple

KOKUSAI ELECTRIC CORP3 citations72
US12241159B2Mar 4, 2025

Substrate processing apparatus and ceiling heater

KOKUSAI ELECTRIC CORP0 citations62
US11049742B2Jun 29, 2021

Substrate processing apparatus, method of manufacturing semiconductor device, and thermocouple support

KOKUSAI ELECTRIC CORP0 citations62
US12293930B2May 6, 2025

Substrate processing apparatus, method of manufacturing semiconductor device and heater

KOKUSAI ELECTRIC CORP0 citations52
US12085338B2Sep 10, 2024

Heater, temperature control system, and processing apparatus

KOKUSAI ELECTRIC CORP0 citations51
US12461507B2Nov 4, 2025

Substrate processing apparatus, substrate processing method, semiconductor device manufacturing method, and control program

KOKUSAI ELECTRIC CORP0 citations48

MURATA HITOSHI

4 patents

KOSUGI TETSUYA

2 patents