Inventor · disambiguated record
James Wiley
Also filed as: WILEY JAMES · WILEY JAMES N · WILEY JAMES NORMAN
25 granted patents·9 pending applications·600 citations·filing 1997–2022
97Inventor score
Files withASML NETHERLANDS BV12KLA TENCOR CORP9KLA TENCOR3KLA TENCOR TECH CORP2KLA TENCOR TECH CORPORATION2
Top patents by PatentIndex Score
34 records- 0198US8057967B2Process window signature patterns for lithography process controlYE JUN·Filed 2010·Granted Nov 15, 2011·39 cites·11 claims
- 0297US7853920B2Method for detecting, sampling, analyzing, and correcting marginal patterns in integrated circuit manufacturingASML NETHERLANDS BV·Filed 2006·Granted Dec 14, 2010·67 cites·28 claims
- 0397US7695876B2Method for identifying and using process window signature patterns for lithography process controlBRION TECH INC·Filed 2006·Granted Apr 13, 2010·61 cites·26 claims
- 0496US10983431B2Pellicle and pellicle assemblyASML NETHERLANDS BV·Filed 2019·Granted Apr 20, 2021·5 cites·20 claims
- 0596US10571800B2Mask assembly and associated methodsASML NETHERLANDS BV·Filed 2016·Granted Feb 25, 2020·9 cites·27 claims
- 0696US8318391B2Process window signature patterns for lithography process controlYE JUN·Filed 2011·Granted Nov 27, 2012·12 cites·21 claims
- 0795US6529621B1Mechanisms for making and inspecting reticlesKLA TENCOR·Filed 1998·Granted Mar 4, 2003·135 cites·38 claims
- 0894US6076465ASystem and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 1997·Granted Jun 20, 2000·113 cites·25 claims
- 0993US10466585B2Pellicle and pellicle assemblyASML NETHERLANDS BV·Filed 2016·Granted Nov 5, 2019·4 cites·20 claims
- 1093US6748103B2Mechanisms for making and inspecting reticlesKLA TENCOR·Filed 2003·Granted Jun 8, 2004·45 cites·26 claims
- 1192US8056028B2Method of performing mask-writer tuning and optimizationASML NETHERLANDS BV·Filed 2009·Granted Nov 8, 2011·15 cites·10 claims
- 1288US11635681B2Mask assembly and associated methodsASML NETHERLANDS BV·Filed 2021·Granted Apr 25, 2023·1 cites·13 claims
- 1387US10139725B2Lithographic apparatusASML NETHERLANDS BV·Filed 2014·Granted Nov 27, 2018·6 cites·24 claims
- 1483US11029595B2Mask assembly and associated methodsASML NETHERLANDS BV·Filed 2019·Granted Jun 8, 2021·1 cites·19 claims
- 1580US12066758B2Pellicle and pellicle assemblyASML NETHERLANDS BV·Filed 2022·Granted Aug 20, 2024·0 cites·20 claims
- 1680US11086213B2Mask assembly and associated methodsASML NETHERLANDS BV·Filed 2020·Granted Aug 10, 2021·1 cites·8 claims
- 1779US9002497B2Methods and systems for inspection of wafers and reticles using designer intent dataVOLK WILLIAM·Filed 2004·Granted Apr 7, 2015·14 cites·39 claims
- 1876US11347142B2Pellicle and pellicle assemblyASML NETHERLANDS BV·Filed 2021·Granted May 31, 2022·0 cites·20 claims
- 1975US10713771B2Methods and systems for inspection of wafers and reticles using designer intent dataKLA TENCOR TECH CORPORATION·Filed 2018·Granted Jul 14, 2020·1 cites·29 claims
- 2074US6654489B2Apparatus and methods for collecting global data during a reticle inspectionKLA TENCOR TECH CORP·Filed 2002·Granted Nov 25, 2003·17 cites·31 claims
- 2169US6731787B1System and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 2002·Granted May 4, 2004·9 cites·8 claims
- 2268US6381358B1System and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 2000·Granted Apr 30, 2002·15 cites·25 claims
- 2365US11348222B2Methods and systems for inspection of wafers and reticles using designer intent dataKLA TENCOR TECH CORPORATION·Filed 2019·Granted May 31, 2022·0 cites·30 claims
- 2463US6516085B1Apparatus and methods for collecting global data during a reticle inspectionKLA TENCOR·Filed 1999·Granted Feb 4, 2003·30 cites·29 claims
- 2557US2009324054A1System and method for determing reticle defect printabilityVACCA ANTHONY·Filed 2009·Application pending·0 cites
- 2657US2008081385A1Methods and systems for inspection of wafers and reticles using designer intent dataMARELLA PAUL F·Filed 2007·Application pending·0 cites
- 2756US2015178914A1Methods and Systems for Inspection of Wafers and Reticles Using Designer Intent DataKLA TENCOR TECH CORP·Filed 2015·Application pending·0 cites
- 2854US11287748B2Guided patterning device inspectionASML NETHERLANDS BV·Filed 2019·Granted Mar 29, 2022·0 cites·20 claims
- 2954US2007140548A1System and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 2006·Application pending·0 cites
- 3054US2008133160A1System and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 2007·Application pending·0 cites
- 3143US2005140970A1System and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 2005·Application pending·0 cites
- 3241US2003138138A1System and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 2003·Application pending·0 cites
- 3340US2004096094A1System and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 2003·Application pending·0 cites
- 3438US2002126888A1System and method for determining reticle defect printabilityKLA TENCOR CORP·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →