Inventor · disambiguated record
William Johanson
Also filed as: JOHANSON JR WILLIAM R · JOHANSON WILLIAM · JOHANSON WILLIAM R
25 granted patents·5 pending applications·1,130 citations·filing 1999–2025
96Inventor score
Top patents by PatentIndex Score
30 records- 0197USD797067STarget profile for a physical vapor deposition chamber targetAPPLIED MATERIALS INC·Filed 2015·Granted Sep 12, 2017·355 cites·1 claims
- 0297US7737035B1Dual seal deposition process chamber and processNOVELLUS SYSTEMS INC·Filed 2006·Granted Jun 15, 2010·472 cites·33 claims
- 0393US12014906B2High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) for PVD chamberAPPLIED MATERIALS INC·Filed 2021·Granted Jun 18, 2024·2 cites·20 claims
- 0492USD902165STarget profile for a physical vapor deposition chamber targetAPPLIED MATERIALS INC·Filed 2020·Granted Nov 17, 2020·18 cites·1 claims
- 0591US10103012B2One-piece process kit shield for reducing the impact of an electric field near the substrateAPPLIED MATERIALS INC·Filed 2016·Granted Oct 16, 2018·3 cites·20 claims
- 0691USD825504STarget profile for a physical vapor deposition chamber targetAPPLIED MATERIALS INC·Filed 2017·Granted Aug 14, 2018·34 cites·1 claims
- 0790US11049701B2Biased cover ring for a substrate processing systemAPPLIED MATERIALS INC·Filed 2017·Granted Jun 29, 2021·3 cites·19 claims
- 0890USD877101STarget profile for a physical vapor deposition chamber targetAPPLIED MATERIALS INC·Filed 2018·Granted Mar 3, 2020·31 cites·1 claims
- 0990USD851613STarget profile for a physical vapor deposition chamber targetAPPLIED MATERIALS INC·Filed 2017·Granted Jun 18, 2019·33 cites·1 claims
- 1090US6405101B1Wafer centering system and methodNOVELLUS SYSTEMS INC·Filed 1999·Granted Jun 11, 2002·134 cites·30 claims
- 1189US9909206B2Process kit having tall deposition ring and deposition ring clampAPPLIED MATERIALS INC·Filed 2016·Granted Mar 6, 2018·6 cites·20 claims
- 1288USD894137STarget profile for a physical vapor deposition chamber targetAPPLIED MATERIALS INC·Filed 2019·Granted Aug 25, 2020·26 cites·1 claims
- 1387US9953812B2Integrated process kit for a substrate processing chamberAPPLIED MATERIALS INC·Filed 2016·Granted Apr 24, 2018·2 cites·20 claims
- 1481US9991101B2Magnetron assembly for physical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2015·Granted Jun 5, 2018·3 cites·20 claims
- 1580US9472443B2Selectively groundable cover ring for substrate process chambersAPPLIED MATERIALS INC·Filed 2013·Granted Oct 18, 2016·4 cites·19 claims
- 1673US11024490B2Magnetron having enhanced target cooling configurationAPPLIED MATERIALS INC·Filed 2018·Granted Jun 1, 2021·1 cites·20 claims
- 1772US11655534B2Apparatus for reducing tungsten resistivityAPPLIED MATERIALS INC·Filed 2022·Granted May 23, 2023·0 cites·10 claims
- 1872US11447857B2Methods and apparatus for reducing tungsten resistivityAPPLIED MATERIALS INC·Filed 2020·Granted Sep 20, 2022·0 cites·14 claims
- 1972US10648071B2Process kit having a floating shadow ringAPPLIED MATERIALS INC·Filed 2017·Granted May 12, 2020·1 cites·20 claims
- 2072US10283334B2Methods and apparatus for maintaining low non-uniformity over target lifeAPPLIED MATERIALS INC·Filed 2014·Granted May 7, 2019·0 cites·15 claims
- 2171US9315891B2Methods for processing a substrate using multiple substrate support positionsAPPLIED MATERIALS INC·Filed 2013·Granted Apr 19, 2016·2 cites·10 claims
- 2263US11056325B2Methods and apparatus for substrate edge uniformityAPPLIED MATERIALS INC·Filed 2018·Granted Jul 6, 2021·0 cites·20 claims
- 2361US2025290193A1Molybdenum physical vapor deposition targetAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2460US12368028B2Apparatus for improved high pressure plasma processingAPPLIED MATERIALS INC·Filed 2022·Granted Jul 22, 2025·0 cites·18 claims
- 2559US2019259586A1Methods and apparatus for maintaining low non-uniformity over target lifeAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2655US2020303172A1Target assembly shieldAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2752US11270898B2Apparatus for enhancing flow uniformity in a process chamberAPPLIED MATERIALS INC·Filed 2019·Granted Mar 8, 2022·0 cites·19 claims
- 2850US11361982B2Methods and apparatus for in-situ cleaning of electrostatic chucksAPPLIED MATERIALS INC·Filed 2019·Granted Jun 14, 2022·0 cites·20 claims
- 2942US2008081114A1Apparatus and method for delivering uniform fluid flow in a chemical deposition systemNOVELLUS SYSTEMS INC·Filed 2006·Application pending·0 cites
- 3041US2020321202A1Shield kit for process chamberAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →