Inventor
SAVANDAIAH KIRANKUMAR NEELASANDRA
IN59 patents
Patents
50 patentsUSD888903SJun 30, 2020
Deposition ring for physical vapor deposition chamber
APPLIED MATERIALS INC70 citations98
USD1040304SAug 27, 2024
Deposition ring for physical vapor deposition chamber
APPLIED MATERIALS INC19 citations94
USD966357SOct 11, 2022
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC21 citations93
USD940765SJan 11, 2022
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC19 citations93
USD937329SNov 30, 2021
Sputter target for a physical vapor deposition chamber
APPLIED MATERIALS INC19 citations93
USD908645SJan 26, 2021
Sputtering target for a physical vapor deposition chamber
APPLIED MATERIALS INC29 citations93
USD933726SOct 19, 2021
Deposition ring for a semiconductor processing chamber
APPLIED MATERIALS INC40 citations92
USD902165SNov 17, 2020
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC18 citations92
USD877101SMar 3, 2020
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC31 citations92
USD970566SNov 22, 2022
Sputter target for a physical vapor deposition chamber
APPLIED MATERIALS INC12 citations84
USD1007449SDec 12, 2023
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC6 citations83
US12080571B2Sep 3, 2024
Substrate processing module and method of moving a workpiece
APPLIED MATERIALS INC5 citations74
US11915918B2Feb 27, 2024
Cleaning of sin with CCP plasma or RPS clean
APPLIED MATERIALS INC4 citations74
US10998209B2May 4, 2021
Substrate processing platforms including multiple processing chambers
APPLIED MATERIALS INC2 citations73
US11817331B2Nov 14, 2023
Substrate holder replacement with protective disk during pasting process
APPLIED MATERIALS INC2 citations72
US11749542B2Sep 5, 2023
Apparatus, system, and method for non-contact temperature monitoring of substrate supports
APPLIED MATERIALS INC3 citations72
US11600507B2Mar 7, 2023
Pedestal assembly for a substrate processing chamber
APPLIED MATERIALS INC2 citations72
US11581167B2Feb 14, 2023
Process kit having tall deposition ring and smaller diameter electrostatic chuck (ESC) for PVD chamber
APPLIED MATERIALS INC2 citations72
US12347719B2Jul 1, 2025
Floating pin for substrate transfer
APPLIED MATERIALS INC3 citations71
US11846013B2Dec 19, 2023
Methods and apparatus for extended chamber for through silicon via deposition
APPLIED MATERIALS INC2 citations71
US11289312B2Mar 29, 2022
Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability
APPLIED MATERIALS INC4 citations71
US11610799B2Mar 21, 2023
Electrostatic chuck having a heating and chucking capabilities
APPLIED MATERIALS INC2 citations69
US11600477B2Mar 7, 2023
Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process
APPLIED MATERIALS INC2 citations69
US12506020B2Dec 23, 2025
Substrate processing module and method of moving a workpiece
APPLIED MATERIALS INC0 citations62
US12266551B2Apr 1, 2025
Apparatus, system, and method for non-contact temperature monitoring of substrate supports
APPLIED MATERIALS INC0 citations62
US12027354B2Jul 2, 2024
Cleaning of SIN with CCP plasma or RPS clean
APPLIED MATERIALS INC0 citations62
US11961723B2Apr 16, 2024
Process kit having tall deposition ring for PVD chamber
APPLIED MATERIALS INC0 citations62
US11270898B2Mar 8, 2022
Apparatus for enhancing flow uniformity in a process chamber
APPLIED MATERIALS INC0 citations62
US12581900B2Mar 17, 2026
Semiconductor process equipment
APPLIED MATERIALS INC0 citations61
US12581901B2Mar 17, 2026
Semiconductor process equipment
APPLIED MATERIALS INC0 citations61
USD1118552SMar 17, 2026
Substrate carrier
APPLIED MATERIALS INC0 citations61
US12568796B2Mar 3, 2026
Semiconductor process equipment
APPLIED MATERIALS INC0 citations61
US12494395B2Dec 9, 2025
Apparatus for controlling lift pin movement
APPLIED MATERIALS INC0 citations61
US12381101B2Aug 5, 2025
Semiconductor process equipment
APPLIED MATERIALS INC0 citations61
US12338527B2Jun 24, 2025
Shutter disk for physical vapor deposition (PVD) chamber
APPLIED MATERIALS INC0 citations61
US12217982B2Feb 4, 2025
Isolated volume seals and method of forming an isolated volume within a processing chamber
APPLIED MATERIALS INC0 citations61
US12100614B2Sep 24, 2024
Apparatus for controlling lift pin movement
APPLIED MATERIALS INC0 citations61
US11955355B2Apr 9, 2024
Isolated volume seals and method of forming an isolated volume within a processing chamber
APPLIED MATERIALS INC1 citations61
US11646217B2May 9, 2023
Transfer apparatus and substrate-supporting member
APPLIED MATERIALS INC0 citations61
USD1072774SApr 29, 2025
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC1 citations60
US11898236B2Feb 13, 2024
Methods and apparatus for processing a substrate
APPLIED MATERIALS INC1 citations60
US11024490B2Jun 1, 2021
Magnetron having enhanced target cooling configuration
APPLIED MATERIALS INC1 citations60
US12467127B2Nov 11, 2025
Molybdenum monolithic physical vapor deposition target
APPLIED MATERIALS INC0 citations59
US12043896B2Jul 23, 2024
Symmetric pump down mini-volume with laminar flow cavity gas injection for high and low pressure
APPLIED MATERIALS INC0 citations59
US11674227B2Jun 13, 2023
Symmetric pump down mini-volume with laminar flow cavity gas injection for high and low pressure
APPLIED MATERIALS INC0 citations59
US11114288B2Sep 7, 2021
Physical vapor deposition apparatus
APPLIED MATERIALS INC0 citations59
US12183560B2Dec 31, 2024
Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process
APPLIED MATERIALS INC0 citations58
US11492697B2Nov 8, 2022
Apparatus for improved anode-cathode ratio for rf chambers
APPLIED MATERIALS INC0 citations58
US12529133B1Jan 20, 2026
Sputter system with magnet motion source
APPLIED MATERIALS INC0 citations56
US12368028B2Jul 22, 2025
Apparatus for improved high pressure plasma processing
APPLIED MATERIALS INC0 citations56
Showing the top 50 of 59 patents by PatentIndex Score.