Inventor · disambiguated record
Gregory E. Menk
Also filed as: MENK GREGORY · MENK GREGORY E
32 granted patents·14 pending applications·380 citations·filing 1988–2020
97Inventor score
Top patents by PatentIndex Score
46 records- 0198US11724362B2Polishing pads produced by an additive manufacturing processAPPLIED MATERIALS INC·Filed 2020·Granted Aug 15, 2023·5 cites·24 claims
- 0298US10537974B2CMP pad construction with composite material properties using additive manufacturing processesAPPLIED MATERIALS INC·Filed 2018·Granted Jan 21, 2020·17 cites·8 claims
- 0398US10493691B2Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articlesAPPLIED MATERIALS INC·Filed 2017·Granted Dec 3, 2019·16 cites·16 claims
- 0498US9873180B2CMP pad construction with composite material properties using additive manufacturing processesAPPLIED MATERIALS INC·Filed 2015·Granted Jan 23, 2018·41 cites·20 claims
- 0598US9776361B2Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articlesAPPLIED MATERIALS INC·Filed 2015·Granted Oct 3, 2017·21 cites·19 claims
- 0697US10875145B2Polishing pads produced by an additive manufacturing processAPPLIED MATERIALS INC·Filed 2015·Granted Dec 29, 2020·17 cites·19 claims
- 0797US10821573B2Polishing pads produced by an additive manufacturing processAPPLIED MATERIALS INC·Filed 2015·Granted Nov 3, 2020·17 cites·25 claims
- 0897US10384330B2Polishing pads produced by an additive manufacturing processAPPLIED MATERIALS INC·Filed 2015·Granted Aug 20, 2019·22 cites·22 claims
- 0997US10322491B2Printed chemical mechanical polishing padAPPLIED MATERIALS INC·Filed 2015·Granted Jun 18, 2019·17 cites·17 claims
- 1096US10593574B2Techniques for combining CMP process tracking data with 3D printed CMP consumablesAPPLIED MATERIALS INC·Filed 2015·Granted Mar 17, 2020·19 cites·27 claims
- 1195US9138860B2Closed-loop control for improved polishing pad profilesDHANDAPANI SIVAKUMAR·Filed 2011·Granted Sep 22, 2015·23 cites·20 claims
- 1293US7553214B2Polishing article with integrated window stripeAPPLIED MATERIALS INC·Filed 2007·Granted Jun 30, 2009·23 cites·10 claims
- 1390US8388412B2Retaining ring with shaped profilePRABHU GOPALAKRISHNA B·Filed 2011·Granted Mar 5, 2013·16 cites·13 claims
- 1486US8439723B2Chemical mechanical polisher with heater and methodMARKS ROBERT A·Filed 2008·Granted May 14, 2013·21 cites·18 claims
- 1586US7601050B2Polishing apparatus with grooved subpadAPPLIED MATERIALS INC·Filed 2007·Granted Oct 13, 2009·11 cites·14 claims
- 1683US8033895B2Retaining ring with shaped profileAPPLIED MATERIALS INC·Filed 2007·Granted Oct 11, 2011·7 cites·14 claims
- 1782US7063597B2Polishing processes for shallow trench isolation substratesAPPLIED MATERIALS INC·Filed 2003·Granted Jun 20, 2006·30 cites·14 claims
- 1881US7179159B2Materials for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2005·Granted Feb 20, 2007·8 cites·17 claims
- 1975US11958162B2CMP pad construction with composite material properties using additive manufacturing processesAPPLIED MATERIALS INC·Filed 2020·Granted Apr 16, 2024·0 cites·20 claims
- 2074US7841925B2Polishing article with integrated window stripeAPPLIED MATERIALS INC·Filed 2009·Granted Nov 30, 2010·3 cites·20 claims
- 2171US8758085B2Method for compensation of variability in chemical mechanical polishing consumablesDHANDAPANI SIVAKUMAR·Filed 2011·Granted Jun 24, 2014·3 cites·13 claims
- 2271US7429210B2Materials for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2007·Granted Sep 30, 2008·3 cites·18 claims
- 2370US9221147B2Endpointing with selective spectral monitoringQIAN JUN·Filed 2012·Granted Dec 29, 2015·2 cites·24 claims
- 2470US8337279B2Closed-loop control for effective pad conditioningDHANDAPANI SIVAKUMAR·Filed 2009·Granted Dec 25, 2012·4 cites·20 claims
- 2569US2019299357A1Printed chemical mechanical polishing padAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2666US12023853B2Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articlesAPPLIED MATERIALS INC·Filed 2019·Granted Jul 2, 2024·0 cites·18 claims
- 2760US11986922B2Techniques for combining CMP process tracking data with 3D printed CMP consumablesAPPLIED MATERIALS INC·Filed 2019·Granted May 21, 2024·0 cites·18 claims
- 2857US2014237905A1Method of forming polishing sheetAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 2951US4962050AGaAs FET manufacturing process employing channel confining layersITT·Filed 1988·Granted Oct 9, 1990·13 cites·3 claims
- 3051US2010112919A1Monolithic linear polishing sheetAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 3147US2014242881A1Feed forward parameter values for use in theoretically generating spectraAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 3247US2014323017A1Methods and apparatus using energized fluids to clean chemical mechanical planarization polishing padsAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 3346US9177815B2Methods for chemical mechanical planarization of patterned wafersAPPLIED MATERIALS INC·Filed 2013·Granted Nov 3, 2015·0 cites·14 claims
- 3446US2009088051A1Leader and trailer for linear polishing sheetAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 3544US2008182413A1Selective chemistry for fixed abrasive cmpMENK GREGORY E·Filed 2007·Application pending·0 cites
- 3643US4994868AHeterojunction confined channel FETITT·Filed 1988·Granted Feb 19, 1991·9 cites·18 claims
- 3742US2007212976A1Smart polishing media assembly for planarizing substratesAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 3841US10786885B2Thin plastic polishing article for CMP applicationsAPPLIED MATERIALS INC·Filed 2018·Granted Sep 29, 2020·0 cites·20 claims
- 3941US2016101500A1Chemical mechanical polishing pad with internal channelsAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 4041US2012021671A1Real-time monitoring of retaining ring thickness and lifetimeMCREYNOLDS PETER·Filed 2010·Application pending·0 cites
- 4139US4948752AMethod of making sagfets on buffer layersITT·Filed 1990·Granted Aug 14, 1990·7 cites·3 claims
- 4239US2013122783A1Pad conditioning force modeling to achieve constant removal rateMENK GREGORY E·Filed 2011·Application pending·0 cites
- 4337US2004072518A1Platen with patterned surface for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
- 4436US4918493ASagfet with buffer layersITT·Filed 1988·Granted Apr 17, 1990·5 cites·7 claims
- 4531US2003176151A1STI polish enhancement using fixed abrasives with amino acid additivesAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
- 4630US2012009847A1Closed-loop control of cmp slurry flowMENK GREGORY E·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →