P

Inventor

FUKUSHIMA MAKOTO

JP95 patents
⚠️ This page may combine multiple inventors who share the name “FUKUSHIMA MAKOTO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

EBARA CORP

37 patents
USD793976SAug 8, 2017

Substrate retaining ring

EBARA CORP434 citations99
USD634719SMar 22, 2011

Elastic membrane for semiconductor wafer polishing apparatus

EBARA CORP539 citations99
USD633452SMar 1, 2011

Elastic membrane for semiconductor wafer polishing apparatus

EBARA CORP342 citations99
USD769200SOct 18, 2016

Elastic membrane for semiconductor wafer polishing apparatus

EBARA CORP48 citations98
US7357699B2Apr 15, 2008

Substrate holding apparatus and polishing apparatus

EBARA CORP49 citations96
US6852019B2Feb 8, 2005

Substrate holding apparatus

EBARA CORP49 citations96
USD808349SJan 23, 2018

Elastic membrane for semiconductor wafer polishing apparatus

EBARA CORP18 citations94
USD766849SSep 20, 2016

Substrate retaining ring

EBARA CORP25 citations94
USD839224SJan 29, 2019

Elastic membrane for semiconductor wafer polishing

EBARA CORP28 citations93
US10040166B2Aug 7, 2018

Polishing apparatus

EBARA CORP11 citations93
US7311585B2Dec 25, 2007

Substrate holding apparatus and polishing apparatus

EBARA CORP15 citations92
US7083507B2Aug 1, 2006

Substrate holding apparatus

EBARA CORP14 citations92
US7033260B2Apr 25, 2006

Substrate holding device and polishing device

EBARA CORP20 citations92
US10442056B2Oct 15, 2019

Substrate holding apparatus and polishing apparatus

EBARA CORP16 citations86
US10702972B2Jul 7, 2020

Polishing apparatus

EBARA CORP7 citations84
USD859332SSep 10, 2019

Elastic membrane for semiconductor wafer polishing

EBARA CORP10 citations84
US10293455B2May 21, 2019

Polishing apparatus

EBARA CORP5 citations84
USD799437SOct 10, 2017

Substrate retaining ring

EBARA CORP16 citations84
USD794585SAug 15, 2017

Retainer ring for substrate

EBARA CORP12 citations84
US9662764B2May 30, 2017

Substrate holder, polishing apparatus, and polishing method

EBARA CORP7 citations84
USD770990SNov 8, 2016

Elastic membrane for semiconductor wafer polishing apparatus

EBARA CORP6 citations84
US9403255B2Aug 2, 2016

Polishing apparatus and polishing method

EBARA CORP14 citations84
USD729753SMay 19, 2015

Elastic membrane for semiconductor wafer polishing

EBARA CORP7 citations84
US8859070B2Oct 14, 2014

Elastic membrane

EBARA CORP16 citations84
US7988537B2Aug 2, 2011

Substrate holding apparatus and polishing apparatus

EBARA CORP8 citations84
US7867063B2Jan 11, 2011

Substrate holding apparatus and polishing apparatus

EBARA CORP8 citations84
US7635292B2Dec 22, 2009

Substrate holding device and polishing apparatus

EBARA CORP13 citations84
US7632173B2Dec 15, 2009

Substrate holding apparatus and polishing apparatus

EBARA CORP11 citations84
US7491117B2Feb 17, 2009

Substrate holding apparatus

EBARA CORP11 citations84
US7108592B2Sep 19, 2006

Substrate holding apparatus and polishing apparatus

EBARA CORP14 citations84
USD913977SMar 23, 2021

Elastic membrane for semiconductor wafer polishing

EBARA CORP5 citations83
US7967665B2Jun 28, 2011

Substrate holding apparatus, polishing apparatus, and polishing method

EBARA CORP5 citations74
US7163895B2Jan 16, 2007

Polishing method

EBARA CORP9 citations74
US11548113B2Jan 10, 2023

Method and apparatus for polishing a substrate

EBARA CORP2 citations73
US11472001B2Oct 18, 2022

Elastic membrane and substrate holding apparatus

EBARA CORP2 citations73
US11088011B2Aug 10, 2021

Elastic membrane, substrate holding device, and polishing apparatus

EBARA CORP2 citations73
US10537975B2Jan 21, 2020

Substrate adsorption method, substrate holding apparatus, substrate polishing apparatus, elastic film, substrate adsorption determination method for substrate holding apparatus, and pressure control method for substrate holding apparatus

EBARA CORP2 citations73

FUKUSHIMA MAKOTO

3 patents
US8932106B2Jan 13, 2015

Polishing apparatus having thermal energy measuring means

FUKUSHIMA MAKOTO14 citations92
USD711330SAug 19, 2014

Elastic membrane for semiconductor wafer polishing

FUKUSHIMA MAKOTO7 citations83
US9308621B2Apr 12, 2016

Method and apparatus for polishing a substrate

FUKUSHIMA MAKOTO6 citations82

KOTOBUKI & CO LTD

3 patents
US5762435AJun 9, 1998

Cap for writing instrument

KOTOBUKI & CO LTD17 citations84
US6599046B2Jul 29, 2003

Direct liquid type writing instrument

KOTOBUKI & CO LTD9 citations74
US6220774B1Apr 24, 2001

Ballpoint tip for ballpoint liquid container

KOTOBUKI & CO LTD10 citations74

NABEYA OSAMU

2 patents
US8083571B2Dec 27, 2011

Polishing apparatus

NABEYA OSAMU22 citations92
US8100743B2Jan 24, 2012

Polishing apparatus

NABEYA OSAMU14 citations83

YASUDA HOZUMI

2 patents
US8485866B2Jul 16, 2013

Substrate holding apparatus, polishing apparatus, and polishing method

YASUDA HOZUMI8 citations83
US8070560B2Dec 6, 2011

Polishing apparatus and method

YASUDA HOZUMI13 citations83

HITACHI LTD

2 patents
US6346772B1Feb 12, 2002

Wiring substrate and gas discharge display device that includes a dry etched layer wet-etched first or second electrodes

HITACHI LTD13 citations81
US6261144B1Jul 17, 2001

Wiring substrate and gas discharge display device and method therefor

HITACHI LTD14 citations81

HITACHI ELECTR ENG

1 patent
US6204681B1Mar 20, 2001

IC device contactor

HITACHI ELECTR ENG51 citations89

Showing the top 50 of 95 patents by PatentIndex Score.