P

Inventor

NAMIKI KEISUKE

JP48 patents
⚠️ This page may combine multiple inventors who share the name “NAMIKI KEISUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

EBARA CORP

46 patents
USD793976SAug 8, 2017

Substrate retaining ring

EBARA CORP434 citations99
USD634719SMar 22, 2011

Elastic membrane for semiconductor wafer polishing apparatus

EBARA CORP539 citations99
USD633452SMar 1, 2011

Elastic membrane for semiconductor wafer polishing apparatus

EBARA CORP342 citations99
USD769200SOct 18, 2016

Elastic membrane for semiconductor wafer polishing apparatus

EBARA CORP48 citations98
US6852019B2Feb 8, 2005

Substrate holding apparatus

EBARA CORP49 citations96
US5651724AJul 29, 1997

Method and apparatus for polishing workpiece

EBARA CORP66 citations95
USD808349SJan 23, 2018

Elastic membrane for semiconductor wafer polishing apparatus

EBARA CORP18 citations94
USD766849SSep 20, 2016

Substrate retaining ring

EBARA CORP25 citations94
USD839224SJan 29, 2019

Elastic membrane for semiconductor wafer polishing

EBARA CORP28 citations93
US7083507B2Aug 1, 2006

Substrate holding apparatus

EBARA CORP14 citations92
US6890402B2May 10, 2005

Substrate holding apparatus and substrate polishing apparatus

EBARA CORP26 citations92
US10442056B2Oct 15, 2019

Substrate holding apparatus and polishing apparatus

EBARA CORP16 citations86
US10702972B2Jul 7, 2020

Polishing apparatus

EBARA CORP7 citations84
USD859332SSep 10, 2019

Elastic membrane for semiconductor wafer polishing

EBARA CORP10 citations84
USD799437SOct 10, 2017

Substrate retaining ring

EBARA CORP16 citations84
USD794585SAug 15, 2017

Retainer ring for substrate

EBARA CORP12 citations84
US9662764B2May 30, 2017

Substrate holder, polishing apparatus, and polishing method

EBARA CORP7 citations84
USD770990SNov 8, 2016

Elastic membrane for semiconductor wafer polishing apparatus

EBARA CORP6 citations84
US9403255B2Aug 2, 2016

Polishing apparatus and polishing method

EBARA CORP14 citations84
USD729753SMay 19, 2015

Elastic membrane for semiconductor wafer polishing

EBARA CORP7 citations84
US8859070B2Oct 14, 2014

Elastic membrane

EBARA CORP16 citations84
US7491117B2Feb 17, 2009

Substrate holding apparatus

EBARA CORP11 citations84
USD913977SMar 23, 2021

Elastic membrane for semiconductor wafer polishing

EBARA CORP5 citations83
US12183642B2Dec 31, 2024

Film-thickness measuring method, method of detecting notch portion, and polishing apparatus

EBARA CORP2 citations73
US11088011B2Aug 10, 2021

Elastic membrane, substrate holding device, and polishing apparatus

EBARA CORP2 citations73
USD813180SMar 20, 2018

Elastic membrane for semiconductor wafer polishing apparatus

EBARA CORP2 citations73
US9815171B2Nov 14, 2017

Substrate holder, polishing apparatus, polishing method, and retaining ring

EBARA CORP2 citations73
US7850509B2Dec 14, 2010

Substrate holding apparatus

EBARA CORP5 citations73
US7156725B2Jan 2, 2007

Substrate polishing machine

EBARA CORP7 citations73
US11179823B2Nov 23, 2021

Substrate holding apparatus, elastic membrane, polishing apparatus, and method for replacing elastic membrane

EBARA CORP3 citations72
US10464185B2Nov 5, 2019

Substrate polishing method, top ring, and substrate polishing apparatus

EBARA CORP2 citations72
US10391603B2Aug 27, 2019

Polishing apparatus, control method and recording medium

EBARA CORP4 citations72
US12128523B2Oct 29, 2024

Polishing apparatus

EBARA CORP0 citations63
US12068189B2Aug 20, 2024

Elastic membrane, substrate holding device, and polishing apparatus

EBARA CORP0 citations62
US11958163B2Apr 16, 2024

Substrate holding apparatus, elastic membrane, polishing apparatus, and method for replacing elastic membrane

EBARA CORP1 citations62
USD918161SMay 4, 2021

Elastic membrane

EBARA CORP1 citations62
US7897007B2Mar 1, 2011

Substrate holding apparatus and substrate polishing apparatus

EBARA CORP3 citations62
US7901550B2Mar 8, 2011

Plating apparatus

EBARA CORP5 citations61
US12381089B2Aug 5, 2025

Information processing system, information processing method, program, and substrate processing apparatus

EBARA CORP0 citations52
US11969858B2Apr 30, 2024

Substrate processing apparatus

EBARA CORP0 citations52
US11745306B2Sep 5, 2023

Polishing apparatus and method of controlling inclination of stationary ring

EBARA CORP0 citations52
US11731235B2Aug 22, 2023

Polishing apparatus and polishing method

EBARA CORP0 citations52
US9573241B2Feb 21, 2017

Polishing apparatus and polishing method

EBARA CORP0 citations52
US10213896B2Feb 26, 2019

Elastic membrane, substrate holding apparatus, and polishing apparatus

EBARA CORP0 citations51
US9999956B2Jun 19, 2018

Polishing device and polishing method

EBARA CORP0 citations51
US9676076B2Jun 13, 2017

Polishing method and polishing apparatus

EBARA CORP0 citations42

FUKUSHIMA MAKOTO

1 patent

TOGAWA TETSUJI

1 patent