Inventor
NABEYA OSAMU
JP99 patents
⚠️ This page may combine multiple inventors who share the name “NABEYA OSAMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
EBARA CORP
44 patentsUSD793976SAug 8, 2017
Substrate retaining ring
EBARA CORP434 citations99
USD634719SMar 22, 2011
Elastic membrane for semiconductor wafer polishing apparatus
EBARA CORP539 citations99
USD633452SMar 1, 2011
Elastic membrane for semiconductor wafer polishing apparatus
EBARA CORP342 citations99
USD769200SOct 18, 2016
Elastic membrane for semiconductor wafer polishing apparatus
EBARA CORP48 citations98
US6609962B1Aug 26, 2003
Dressing apparatus and polishing apparatus
EBARA CORP85 citations98
US7357699B2Apr 15, 2008
Substrate holding apparatus and polishing apparatus
EBARA CORP49 citations96
US6852019B2Feb 8, 2005
Substrate holding apparatus
EBARA CORP49 citations96
USD808349SJan 23, 2018
Elastic membrane for semiconductor wafer polishing apparatus
EBARA CORP18 citations94
USD766849SSep 20, 2016
Substrate retaining ring
EBARA CORP25 citations94
USD839224SJan 29, 2019
Elastic membrane for semiconductor wafer polishing
EBARA CORP28 citations93
US10040166B2Aug 7, 2018
Polishing apparatus
EBARA CORP11 citations93
US7207862B2Apr 24, 2007
Polishing apparatus and method for detecting foreign matter on polishing surface
EBARA CORP37 citations93
US7140955B2Nov 28, 2006
Polishing apparatus
EBARA CORP37 citations93
US7311585B2Dec 25, 2007
Substrate holding apparatus and polishing apparatus
EBARA CORP15 citations92
US7083507B2Aug 1, 2006
Substrate holding apparatus
EBARA CORP14 citations92
US7033260B2Apr 25, 2006
Substrate holding device and polishing device
EBARA CORP20 citations92
US10442056B2Oct 15, 2019
Substrate holding apparatus and polishing apparatus
EBARA CORP16 citations86
USD981459SMar 21, 2023
Retaining ring for substrate
EBARA CORP7 citations84
US10702972B2Jul 7, 2020
Polishing apparatus
EBARA CORP7 citations84
US10486285B2Nov 26, 2019
Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method
EBARA CORP9 citations84
USD859332SSep 10, 2019
Elastic membrane for semiconductor wafer polishing
EBARA CORP10 citations84
US10293455B2May 21, 2019
Polishing apparatus
EBARA CORP5 citations84
US9833875B2Dec 5, 2017
Polishing apparatus and retainer ring configuration
EBARA CORP5 citations84
USD799437SOct 10, 2017
Substrate retaining ring
EBARA CORP16 citations84
USD794585SAug 15, 2017
Retainer ring for substrate
EBARA CORP12 citations84
US9662764B2May 30, 2017
Substrate holder, polishing apparatus, and polishing method
EBARA CORP7 citations84
USD770990SNov 8, 2016
Elastic membrane for semiconductor wafer polishing apparatus
EBARA CORP6 citations84
US9403255B2Aug 2, 2016
Polishing apparatus and polishing method
EBARA CORP14 citations84
US9358662B2Jun 7, 2016
Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method
EBARA CORP9 citations84
USD729753SMay 19, 2015
Elastic membrane for semiconductor wafer polishing
EBARA CORP7 citations84
US8859070B2Oct 14, 2014
Elastic membrane
EBARA CORP16 citations84
US7988537B2Aug 2, 2011
Substrate holding apparatus and polishing apparatus
EBARA CORP8 citations84
US7867063B2Jan 11, 2011
Substrate holding apparatus and polishing apparatus
EBARA CORP8 citations84
US7635292B2Dec 22, 2009
Substrate holding device and polishing apparatus
EBARA CORP13 citations84
US7632173B2Dec 15, 2009
Substrate holding apparatus and polishing apparatus
EBARA CORP11 citations84
US7491117B2Feb 17, 2009
Substrate holding apparatus
EBARA CORP11 citations84
US7108592B2Sep 19, 2006
Substrate holding apparatus and polishing apparatus
EBARA CORP14 citations84
USD913977SMar 23, 2021
Elastic membrane for semiconductor wafer polishing
EBARA CORP5 citations83
USD989012SJun 13, 2023
Elastic membrane
EBARA CORP4 citations74
US7967665B2Jun 28, 2011
Substrate holding apparatus, polishing apparatus, and polishing method
EBARA CORP5 citations74
US7163895B2Jan 16, 2007
Polishing method
EBARA CORP9 citations74
US6607427B2Aug 19, 2003
Dressing apparatus and polishing apparatus
EBARA CORP12 citations74
US12183642B2Dec 31, 2024
Film-thickness measuring method, method of detecting notch portion, and polishing apparatus
EBARA CORP2 citations73
US11426834B2Aug 30, 2022
Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method
EBARA CORP1 citations73
NABEYA OSAMU
2 patentsMIYAZAKI MITSURU
1 patentFUKUSHIMA MAKOTO
1 patentYASUDA HOZUMI
1 patentSAITO KENICHIRO
1 patentShowing the top 50 of 99 patents by PatentIndex Score.