Inventor
ZHANG FUHONG
US41 patents
Patents
41 patentsUSD801942SNov 7, 2017
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC336 citations99
USD797067SSep 12, 2017
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC355 citations98
USD946638SMar 22, 2022
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC20 citations94
USD869409SDec 10, 2019
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC22 citations94
USD868124SNov 26, 2019
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC28 citations94
USD837755SJan 8, 2019
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC30 citations94
USD836572SDec 25, 2018
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC30 citations94
USD825504SAug 14, 2018
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC34 citations93
US7294574B2Nov 13, 2007
Sputter deposition and etching of metallization seed layer for overhang and sidewall improvement
APPLIED MATERIALS INC36 citations92
US9960024B2May 1, 2018
Biasable flux optimizer / collimator for PVD sputter chamber
APPLIED MATERIALS INC12 citations91
USD859333SSep 10, 2019
Collimator for a physical vapor deposition chamber
APPLIED MATERIALS INC14 citations85
USD858468SSep 3, 2019
Collimator for a physical vapor deposition chamber
APPLIED MATERIALS INC14 citations85
USD998575SSep 12, 2023
Collimator for use in a physical vapor deposition (PVD) chamber
APPLIED MATERIALS INC10 citations84
USD997111SAug 29, 2023
Collimator for use in a physical vapor deposition (PVD) chamber
APPLIED MATERIALS INC9 citations84
USD1038901SAug 13, 2024
Collimator for a physical vapor deposition chamber
APPLIED MATERIALS INC5 citations83
US10347474B2Jul 9, 2019
Biasable flux optimizer / collimator for PVD sputter chamber
APPLIED MATERIALS INC4 citations83
USD1009816SJan 2, 2024
Collimator for a physical vapor deposition chamber
APPLIED MATERIALS INC5 citations73
US11810770B2Nov 7, 2023
Methods and apparatus for controlling ion fraction in physical vapor deposition processes
APPLIED MATERIALS INC2 citations73
US11037768B2Jun 15, 2021
Methods and apparatus for controlling ion fraction in physical vapor deposition processes
APPLIED MATERIALS INC4 citations73
US10727033B2Jul 28, 2020
Biasable flux optimizer / collimator for PVD sputter chamber
APPLIED MATERIALS INC1 citations72
US10157733B2Dec 18, 2018
Methods for igniting a plasma in a substrate processing chamber
APPLIED MATERIALS INC2 citations72
US9991101B2Jun 5, 2018
Magnetron assembly for physical vapor deposition chamber
APPLIED MATERIALS INC3 citations69
USD1110289SJan 27, 2026
Process chamber collimator
APPLIED MATERIALS INC0 citations62
US12412738B1Sep 9, 2025
System for target arcing mapping and plasma diagnosis
APPLIED MATERIALS INC0 citations62
US12094699B2Sep 17, 2024
Methods and apparatus for controlling ion fraction in physical vapor deposition processes
APPLIED MATERIALS INC0 citations62
US11270898B2Mar 8, 2022
Apparatus for enhancing flow uniformity in a process chamber
APPLIED MATERIALS INC0 citations62
US11335577B2May 17, 2022
Methods and apparatus to prevent interference between processing chambers
APPLIED MATERIALS INC0 citations61
US11309169B2Apr 19, 2022
Biasable flux optimizer / collimator for PVD sputter chamber
APPLIED MATERIALS INC0 citations61
US10438828B2Oct 8, 2019
Methods and apparatus to prevent interference between processing chambers
APPLIED MATERIALS INC1 citations61
USD1110975SFeb 3, 2026
Collimator for a physical vapor deposition (PVD) chamber
APPLIED MATERIALS INC0 citations60
US11222816B2Jan 11, 2022
Methods and apparatus for semi-dynamic bottom up reflow
APPLIED MATERIALS INC0 citations60
US11492699B2Nov 8, 2022
Substrate temperature non-uniformity reduction over target life using spacing compensation
APPLIED MATERIALS INC0 citations59
US11289329B2Mar 29, 2022
Methods and apparatus for filling a feature disposed in a substrate
APPLIED MATERIALS INC0 citations58
US12553125B2Feb 17, 2026
Protective gas flow during wafer dechucking in PVD chamber
APPLIED MATERIALS INC0 citations53
US11527437B2Dec 13, 2022
Methods and apparatus for intermixing layer for enhanced metal reflow
APPLIED MATERIALS INC0 citations52
US11393665B2Jul 19, 2022
Physical vapor deposition (PVD) chamber with reduced arcing
APPLIED MATERIALS INC0 citations52
US10283334B2May 7, 2019
Methods and apparatus for maintaining low non-uniformity over target life
APPLIED MATERIALS INC0 citations52
US11562925B2Jan 24, 2023
Method of depositing multilayer stack including copper over features of a device structure
APPLIED MATERIALS INC0 citations51
US12203163B2Jan 21, 2025
Methods for shaping magnetic fields during semiconductor processing
APPLIED MATERIALS INC0 citations47
US11315771B2Apr 26, 2022
Methods and apparatus for processing a substrate
APPLIED MATERIALS INC0 citations46
US9831075B2Nov 28, 2017
Source magnet for improved resputtering uniformity in direct current (DC) physical vapor deposition (PVD) processes
APPLIED MATERIALS INC0 citations41