Inventor
RIKER MARTIN LEE
US45 patents
⚠️ This page may combine multiple inventors who share the name “RIKER MARTIN LEE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
42 patentsUSD801942SNov 7, 2017
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC336 citations99
USD946638SMar 22, 2022
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC20 citations94
USD869409SDec 10, 2019
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC22 citations94
USD868124SNov 26, 2019
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC28 citations94
USD837755SJan 8, 2019
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC30 citations94
USD836572SDec 25, 2018
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC30 citations94
US9543126B2Jan 10, 2017
Collimator for use in substrate processing chambers
APPLIED MATERIALS INC21 citations94
US9960024B2May 1, 2018
Biasable flux optimizer / collimator for PVD sputter chamber
APPLIED MATERIALS INC12 citations91
USD859333SSep 10, 2019
Collimator for a physical vapor deposition chamber
APPLIED MATERIALS INC14 citations85
USD858468SSep 3, 2019
Collimator for a physical vapor deposition chamber
APPLIED MATERIALS INC14 citations85
USD998575SSep 12, 2023
Collimator for use in a physical vapor deposition (PVD) chamber
APPLIED MATERIALS INC10 citations84
USD997111SAug 29, 2023
Collimator for use in a physical vapor deposition (PVD) chamber
APPLIED MATERIALS INC9 citations84
US9476122B2Oct 25, 2016
Wafer processing deposition shielding components
APPLIED MATERIALS INC6 citations84
USD1038901SAug 13, 2024
Collimator for a physical vapor deposition chamber
APPLIED MATERIALS INC5 citations83
US10347474B2Jul 9, 2019
Biasable flux optimizer / collimator for PVD sputter chamber
APPLIED MATERIALS INC4 citations83
USD1026839SMay 14, 2024
Collimator for a physical vapor deposition (PVD) chamber
APPLIED MATERIALS INC4 citations73
USD1026054SMay 7, 2024
Collimator for a physical vapor deposition (PVD) chamber
APPLIED MATERIALS INC4 citations73
USD1025936SMay 7, 2024
Collimator for a physical vapor deposition (PVD) chamber
APPLIED MATERIALS INC4 citations73
USD1025935SMay 7, 2024
Collimator for a physical vapor deposition (PVD) chamber
APPLIED MATERIALS INC4 citations73
USD1024149SApr 23, 2024
Collimator for a physical vapor deposition (PVD) chamber
APPLIED MATERIALS INC4 citations73
USD1009816SJan 2, 2024
Collimator for a physical vapor deposition chamber
APPLIED MATERIALS INC5 citations73
US11810770B2Nov 7, 2023
Methods and apparatus for controlling ion fraction in physical vapor deposition processes
APPLIED MATERIALS INC2 citations73
US11037768B2Jun 15, 2021
Methods and apparatus for controlling ion fraction in physical vapor deposition processes
APPLIED MATERIALS INC4 citations73
US10727033B2Jul 28, 2020
Biasable flux optimizer / collimator for PVD sputter chamber
APPLIED MATERIALS INC1 citations72
US10312065B2Jun 4, 2019
Physical vapor deposition (PVD) plasma energy control per dynamic magnetron control
APPLIED MATERIALS INC4 citations72
US9960021B2May 1, 2018
Physical vapor deposition (PVD) target having low friction pads
APPLIED MATERIALS INC5 citations72
USD1110289SJan 27, 2026
Process chamber collimator
APPLIED MATERIALS INC0 citations62
US12094699B2Sep 17, 2024
Methods and apparatus for controlling ion fraction in physical vapor deposition processes
APPLIED MATERIALS INC0 citations62
USD1110979SFeb 3, 2026
Process chamber collimator
APPLIED MATERIALS INC0 citations61
USD1103950SDec 2, 2025
Process chamber collimator
APPLIED MATERIALS INC0 citations61
US11335577B2May 17, 2022
Methods and apparatus to prevent interference between processing chambers
APPLIED MATERIALS INC0 citations61
US11309169B2Apr 19, 2022
Biasable flux optimizer / collimator for PVD sputter chamber
APPLIED MATERIALS INC0 citations61
US10438828B2Oct 8, 2019
Methods and apparatus to prevent interference between processing chambers
APPLIED MATERIALS INC1 citations61
USD1110975SFeb 3, 2026
Collimator for a physical vapor deposition (PVD) chamber
APPLIED MATERIALS INC0 citations60
US11492699B2Nov 8, 2022
Substrate temperature non-uniformity reduction over target life using spacing compensation
APPLIED MATERIALS INC0 citations59
US11492697B2Nov 8, 2022
Apparatus for improved anode-cathode ratio for rf chambers
APPLIED MATERIALS INC0 citations58
US11990319B2May 21, 2024
Methods and apparatus for processing a substrate
APPLIED MATERIALS INC0 citations57
US12529133B1Jan 20, 2026
Sputter system with magnet motion source
APPLIED MATERIALS INC0 citations56
US11915915B2Feb 27, 2024
Apparatus for generating magnetic fields during semiconductor processing
APPLIED MATERIALS INC0 citations49
US12203163B2Jan 21, 2025
Methods for shaping magnetic fields during semiconductor processing
APPLIED MATERIALS INC0 citations47
US11315771B2Apr 26, 2022
Methods and apparatus for processing a substrate
APPLIED MATERIALS INC0 citations46
US9580795B2Feb 28, 2017
Sputter source for use in a semiconductor process chamber
APPLIED MATERIALS INC0 citations42